Effect of annealing on crystallization behavior in Cu₁₅Zr₈₅ amorphous film

The crystallization in Cu₁₅Zr₈₅ amorphous film was studied by using molecular dynamics simulation in a wide annealing temperature region. The effect of annealing temperature on crystallization behavior was evaluated. The degree of crystallization increases firstly and then decreases with the increasing of annealing temperature in Cu₁₅Zr₈₅ amorphous film. A comparison of interior and Surface-A components shows that Surface-A component has higher crystallization rate at low annealing temperature and lower degree of crystallization at high annealing temperature because of faster atomic diffusion. Structural evolution of surface monolayer is unique during annealing. No discernable crystal-like structure is found after annealed in the surface monolayer by directly observing the atomic structure. Surface monolayer with hexagon cluster has low degree of order at high annealing temperature because of the fast liquid-like diffusive motion and improved glass-forming ability.