Assembling silver nanowires using optoelectronic tweezers

Shuailong Zhang, Jonathan M. Cooper, Steve L. Neale*

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

6 Citations (Scopus)

Abstract

Light patterned dielectrophoresis or optoelectronic tweezers (OET) has been proved to be an effective micromanipulation technology for cell separation, cell sorting and control of cell interactions. Apart from being useful for cell biology experiments, the capability of moving small objects accurately also makes OET an attractive technology for other micromanipulation applications. In particular, OET has the potential to be used for efficiently and accurately assembling small optoelectronic/electronic components into circuits. This approach could produce a step change in the size of the smallest components that are routinely assembled; down from the current smallest standard component size of 400×200 μm (0402 metric) to components a few microns across and even nanostructured components. In this work, we have demonstrated the use of OET to manipulate conductive silver nanowires into different patterns. The silver nanowires (typical diameter: 60 nm; typical length: 10 μm) were suspended in a 15 mS/m solution of KCL in water and manipulated by positive dielectrophoresis force generated by OET. A proof-of-concept demonstration was also made to prove the feasibility of using OET to manipulate silver nanowires to form a 150-μm-long conductive path between two isolated electrodes. It can be seen that the resistance between two electrodes was effectively brought down to around 700 Î(c) after the silver nanowires were assembled and the solution evaporated. Future work in this area will focus on increasing the conductivity of these tracks, encapsulating the assembled silver nanowires to prevent silver oxidation and provide mechanical protection, which can be achieved via 3D printing and inkjet printing technology.

Original languageEnglish
Title of host publicationAdvanced Fabrication Technologies for Micro/Nano Optics and Photonics IX
EditorsGeorg von Freymann, Raymond C. Rumpf, Winston V. Schoenfeld
PublisherSPIE
ISBN (Electronic)9781628419948
DOIs
Publication statusPublished - 2016
Externally publishedYes
EventAdvanced Fabrication Technologies for Micro/Nano Optics and Photonics IX - San Francisco, United States
Duration: 14 Feb 201617 Feb 2016

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume9759
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceAdvanced Fabrication Technologies for Micro/Nano Optics and Photonics IX
Country/TerritoryUnited States
CitySan Francisco
Period14/02/1617/02/16

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