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Annealing-free copper source-drain electrodes based on copper–calcium diffusion barrier for amorphous silicon thin film transistor
Zhinong Yu*, Jianshe Xue, Qi Yao, Guanbao Hui, Yurong Jiang, Wei Xue
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
4
Citations
(Scopus)