A W-Band Power Amplifier With 19.6% PAE in 45-nm SOI CMOS

Shutian Cai, Zhiming Chen, Xiaoran Li*, Zicheng Liu, Fang Han, Quanwen Qi, Xinghua Wang

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

This paper presents a two-way power-combing W-band power amplifier (PA) in 45nm SOI CMOS process. To alleviate the parasitism in large-sized transistors, the customized power cell with an optimized layout is adopted. The drain-gate neutralized common-source (CS) stages are employed in the two amplification stages of the PA to enhance power gain and guarantee stability. Two types of transform-based power combining are analyzed and compared. Parallel combining is considered more suitable in this design for a lower transformation ratio and higher power-combining efficiency. The PA is designed and achieves 11.7-dBm output 1-dB compression point (P1dB), 15.2-dBm saturated output power (Psat), and 19.6% power added efficiency (PAE) at 94GHz. The 3-dB bandwidth of the PA is from 85-105GHz.

Original languageEnglish
Title of host publicationIAEAC 2024 - IEEE 7th Advanced Information Technology, Electronic and Automation Control Conference
EditorsBing Xu
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages1896-1900
Number of pages5
ISBN (Electronic)9798350339161
DOIs
Publication statusPublished - 2024
Event7th IEEE Advanced Information Technology, Electronic and Automation Control Conference, IAEAC 2024 - Chongqing, China
Duration: 15 Mar 202417 Mar 2024

Publication series

NameIEEE Advanced Information Technology, Electronic and Automation Control Conference (IAEAC)
ISSN (Print)2689-6621

Conference

Conference7th IEEE Advanced Information Technology, Electronic and Automation Control Conference, IAEAC 2024
Country/TerritoryChina
CityChongqing
Period15/03/2417/03/24

Keywords

  • CMOS
  • Power amplifier (PA)
  • W-band
  • capacitive neutralization
  • power combining

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