A Genetic-Algorithm-Based In-Situ Diagnostic Method for Plasma with Non-Uniform Distribution Profile

Xin Hui Fan, Xiao Wei Huang*, Xin Qing Sheng

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

The plasma sheath generated during the re-entry process of the hypersonic aircraft has a great impact on the electromagnetic radiation, transmission, and scattering problems. In this paper, an in-situ diagnostic method for non-uniformly distributed plasma sheath is proposed based on microwave reflection theory. Using the genetic algorithm, the electron density distribution and collision frequency of the plasma can be inferred from a set of broadband complex reflection coefficients. To mitigate the challenge of the multiple values in the inverse problem, an additional dimension of information can be involved into the reflection coefficients. Specifically, introducing static magnetic fields with varying intensities can help improve the inversion accuracy and robustness. Numerical experiment involving the diagnosis of a typical plasma profile subjected to double Gauss distribution demonstrate the accuracy and effectiveness of the proposed method.

Original languageEnglish
Title of host publication2023 International Applied Computational Electromagnetics Society Symposium, ACES-China 2023
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781733509657
DOIs
Publication statusPublished - 2023
Event2023 International Applied Computational Electromagnetics Society Symposium, ACES-China 2023 - Hangzhou, China
Duration: 15 Aug 202318 Aug 2023

Publication series

Name2023 International Applied Computational Electromagnetics Society Symposium, ACES-China 2023

Conference

Conference2023 International Applied Computational Electromagnetics Society Symposium, ACES-China 2023
Country/TerritoryChina
CityHangzhou
Period15/08/2318/08/23

Keywords

  • genetic algorithm
  • magnetic field
  • microwave reflection
  • non-uniform profile
  • plasma diagnostics

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