Physics
Magnetic Field
100%
Radio Frequency Discharge
71%
Plasma Frequency
70%
Magnetron Sputtering
52%
Ion Implantation
39%
Electron Density
37%
Electron Energy
31%
Boltzmann Equation
31%
Monte Carlo
30%
Cold Plasma
26%
Helicon
26%
Blood Plasma
26%
Plasma Diffusion
25%
Gas Pressure
22%
Electric Potential
17%
Plasma Density
17%
Metastable Atom
13%
Nonuniform Plasmas
13%
Remote Control
13%
Thin Films
13%
Spatial Distribution
13%
Dielectrics
13%
Young's Modulus
13%
Microplasmas
13%
Energy Distribution
12%
Electron Emission
11%
Ion Current
9%
Gas Discharges
8%
Vapor Deposition
7%
Endothermic Reaction
6%
Plasma System
6%
Energy Gaps (Solid State)
6%
Electron Trajectory
6%
Room Temperature
6%
Ion Beams
6%
Transmittance
6%
Electron Cyclotron Resonance
6%
Distribution Function
5%
Engineering
Magnetic Field
49%
Microstructure
39%
Ion Implantation
39%
Radio Frequency
30%
Magnetron
26%
Microplasmas
26%
Boltzmann Equation
22%
Similarities
19%
Demonstrates
19%
Two Dimensional
19%
Eigenmode
19%
High Power Impulse Magnetron Sputtering
16%
Inductively Coupled Plasma
16%
Power Absorption
16%
Spatial Distribution
16%
Input Power
16%
Fluid Model
15%
Coupling Effect
14%
Gas Pressure
14%
Capacitive
13%
Nanocomposite
13%
Deposition Rate
13%
Ionization Rate
13%
Engineering
13%
Thermal Conductivity
13%
Dielectric Window
13%
Sputtering Yield
13%
Direct Current
13%
Capacitive Coupling
13%
Low Surface Tension
13%
Electric Potential
13%
Constraint Condition
13%
Physical Interaction
13%
Anisotropic
13%
Energy Density
13%
Plasma Fluid Model
13%
Textured Surface
13%
Electrode Surface
13%
Forming
13%
Boiling Point
13%
Antenna
13%
Experimental Result
13%
Pressure Balance
13%
Emission Spectra
13%
Bias Voltage
11%
Pulse-off Time
10%
Partial Pressure
9%
Electron Temperature
9%
Cavity Length
9%
Plasma Density
8%
Material Science
Ion Implantation
66%
Supercapacitors
60%
Magnetron Sputtering
49%
Density
43%
Cathode
42%
Capacitance
32%
Graphene
32%
High Power Impulse Magnetron Sputtering
29%
Surface Treatment
29%
MXene
26%
Nanocomposite Coating
26%
Electrophoretic Deposition
26%
Biochar
19%
Plasma Density
17%
Nanocrystalline Material
16%
Dielectric Material
16%
Energy Density
15%
Thin Films
13%
Polyaniline
13%
Thermal Conductivity
13%
Reduced Graphene Oxide
13%
Lithium-Sulfur Battery
13%
Water Vapor
13%
Silver
13%
Refractive Index
13%
Semi-Analytical Method
13%
Surface Tension
13%
Material Processing
13%
Electrophoretic Technology
9%
Indium Ion
9%
Austenitic Stainless Steels
7%
Indium Tin Oxide
6%
Titanium Carbide
6%
Film
6%
Hydraulics
6%
Oxide Compound
5%
Electrical Resistivity
5%
