Vectorial pupil optimization to compensate polarization distortion in immersion lithography system

Tie Li, Yang Liu, Yiyu Sun, Xu Yan, Pengzhi Wei, Yanqiu Li*

*此作品的通讯作者

科研成果: 期刊稿件文章同行评审

10 引用 (Scopus)

摘要

Polarization distortion innately exists in hyper numerical aperture immersion lithography system. Polarization distortion, mainly including polarization aberration (PA) of lithography projection optics and thick mask induced polarization distortion, would seriously impact on lithography imaging quality. Some computational lithography technologies, such as robust optical proximity correction and robust source and mask optimization, have been introduced and developed to reduce the impact of polarization distortion on lithography imaging. In this paper, we innovate a vectorial pupil optimization (VPO) method to further extend degrees of freedom for pupil optimization and compensate polarization distortion for immersion lithography system. An analytical relationship between lithography imaging and active vectorial pupil, and the gradient-based algorithm is adopted to effectively solve VPO. Extensive simulations demonstrate the VPO method simultaneously compensate the PA of projection optics and the thick mask induced polarization distortion sufficiently. Based on PA-aware source mask optimization, the VPO method can further reduce the impact of polarization distortion on lithography imaging. Compared to current pupil wavefront optimization, the proposed VPO effectively reduces the pattern error by 37.2%, which demonstrates the VPO method can improve lithography pattern fidelity.

源语言英语
页(从-至)4412-4425
页数14
期刊Optics Express
28
4
DOI
出版状态已出版 - 17 2月 2020

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