TY - GEN
T1 - Two methods comparison and verification for monochromator calibration of wavelength
AU - Wang, Changshi
AU - He, Yingwei
AU - Gan, Haiyong
AU - Feng, Guojin
AU - Zhang, Junchao
AU - Gui, Yingyi
AU - Xiong, Limin
AU - Zhou, Taogeng
AU - Li, Lin
N1 - Publisher Copyright:
© 2019 SPIE.
PY - 2019
Y1 - 2019
N2 - The monochromators, which are able to separate a specific wavelength light from a complex spectrum and a continuous spectrum light source, have been widely used in optical measurements. As one crucial specification, wavelength accuracy has always been a research theme for monochromator users around the world. When the monochromator is utilized for calibrating the wavelength in the ultraviolet, visible, and near-infrared regions, low-pressure discharged lamps, such as mercury lamps, are usually employed to obtain wavelength deviations at certain wavelength points of atomic emission lines of lamps,which are well-known recognized. For the requirement of monochromator wavelength calibration, a light path based on the low-pressure discharged lamp method was constructed. Three strong radiation flux lines of the mercury lamps were selected and tested,whose wavelength values were 365.015 nm, 435.833 nm, and 546.075 nm. Meanwhile a new method based on continuous spectrum light source and Fourier transform spectrometer was proposed and light path was also built. Near the wavelength value points of the selected atomic emission lines of mercury lamp, a measurement experiment was performed both on the same monochromator and the same experimental conditions, and the wavelength deviation values of the monochromator was obtained. The consistency of the two methods was good, and the best repeatability error was better than 0.005nm. The work of this article is of positive for those measurement laboratories to select suitable approach to perform their monochromators wavelength calibrations.
AB - The monochromators, which are able to separate a specific wavelength light from a complex spectrum and a continuous spectrum light source, have been widely used in optical measurements. As one crucial specification, wavelength accuracy has always been a research theme for monochromator users around the world. When the monochromator is utilized for calibrating the wavelength in the ultraviolet, visible, and near-infrared regions, low-pressure discharged lamps, such as mercury lamps, are usually employed to obtain wavelength deviations at certain wavelength points of atomic emission lines of lamps,which are well-known recognized. For the requirement of monochromator wavelength calibration, a light path based on the low-pressure discharged lamp method was constructed. Three strong radiation flux lines of the mercury lamps were selected and tested,whose wavelength values were 365.015 nm, 435.833 nm, and 546.075 nm. Meanwhile a new method based on continuous spectrum light source and Fourier transform spectrometer was proposed and light path was also built. Near the wavelength value points of the selected atomic emission lines of mercury lamp, a measurement experiment was performed both on the same monochromator and the same experimental conditions, and the wavelength deviation values of the monochromator was obtained. The consistency of the two methods was good, and the best repeatability error was better than 0.005nm. The work of this article is of positive for those measurement laboratories to select suitable approach to perform their monochromators wavelength calibrations.
KW - Fourier transform spectrometer
KW - calibration
KW - monochromator
KW - repeatability error
UR - http://www.scopus.com/inward/record.url?scp=85061202697&partnerID=8YFLogxK
U2 - 10.1117/12.2504882
DO - 10.1117/12.2504882
M3 - Conference contribution
AN - SCOPUS:85061202697
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies
A2 - Fan, Bin
A2 - Wu, Fan
A2 - Zhang, Yudong
A2 - Ma, Xiaoliang
A2 - Li, Xiong
PB - SPIE
T2 - 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test, Measurement Technology, and Equipment
Y2 - 26 June 2018 through 29 June 2018
ER -