TY - GEN
T1 - Truncated size of the rough surface for calculating the backscattering RCS from combined objects
AU - Zhang, X. Y.
AU - Sheng, X. Q.
PY - 2010
Y1 - 2010
N2 - It is known that the time consuming step in the conventional hybrid Kirchhoff Approach-Method of Moment (KA-MoM) method is to calculate the interaction between objects and the rough surface. How to truncate the size of the rough surface is the key of solving this problem. In this paper, 3D problems are studied. According to the characteristics of the scattering at the incident plane and at the vertical plane of the incidence, two different approaches are proposed to reduce the size of the rough surface, and the adaptive selection method is used to find the length of the rough surface. The accuracy and efficiency of the proposed hybrid KA-MoM method are studied by numerical experiments.
AB - It is known that the time consuming step in the conventional hybrid Kirchhoff Approach-Method of Moment (KA-MoM) method is to calculate the interaction between objects and the rough surface. How to truncate the size of the rough surface is the key of solving this problem. In this paper, 3D problems are studied. According to the characteristics of the scattering at the incident plane and at the vertical plane of the incidence, two different approaches are proposed to reduce the size of the rough surface, and the adaptive selection method is used to find the length of the rough surface. The accuracy and efficiency of the proposed hybrid KA-MoM method are studied by numerical experiments.
UR - http://www.scopus.com/inward/record.url?scp=79953803655&partnerID=8YFLogxK
U2 - 10.1109/ICMMT.2010.5525181
DO - 10.1109/ICMMT.2010.5525181
M3 - Conference contribution
AN - SCOPUS:79953803655
SN - 9781424457052
T3 - 2010 International Conference on Microwave and Millimeter Wave Technology, ICMMT 2010
SP - 625
EP - 628
BT - 2010 International Conference on Microwave and Millimeter Wave Technology, ICMMT 2010
T2 - 2010 International Conference on Microwave and Millimeter Wave Technology, ICMMT 2010
Y2 - 8 May 2010 through 11 May 2010
ER -