Thermal expansion coefficient of few-layer MoS2 studied by temperature-dependent Raman spectroscopy

Zhongtao Lin, Wuguo Liu, Shibing Tian, Ke Zhu, Yuan Huang*, Yang Yang*

*此作品的通讯作者

科研成果: 期刊稿件文章同行评审

48 引用 (Scopus)

摘要

The thermal expansion coefficient is an important thermal parameter that influences the performance of nanodevices based on two-dimensional materials. To obtain the thermal expansion coefficient of few-layer MoS2, suspended MoS2 and supported MoS2 were systematically investigated using Raman spectroscopy in the temperature range from 77 to 557 K. The temperature-dependent evolution of the Raman frequency shift for suspended MoS2 exhibited prominent differences from that for supported MoS2, obviously demonstrating the effect due to the thermal expansion coefficient mismatch between MoS2 and the substrate. The intrinsic thermal expansion coefficients of MoS2 with different numbers of layers were calculated. Interestingly, negative thermal expansion coefficients were obtained below 175 K, which was attributed to the bending vibrations in the MoS2 layer during cooling. Our results demonstrate that Raman spectroscopy is a feasible tool for investigating the thermal properties of few-layer MoS2 and will provide useful information for its further application in photoelectronic devices.

源语言英语
文章编号7037
期刊Scientific Reports
11
1
DOI
出版状态已出版 - 12月 2021
已对外发布

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