Thermal and structural deformation and its impact on optical performance of projection optics for extreme ultraviolet lithography

Yanqiu Li; Kazuya Ota; Katsuhiko Murakami

doi:10.1116/1.1534573

Thermal and structural deformation and its impact on optical performance of projection optics for extreme ultraviolet lithography

Yanqiu Li, Kazuya Ota, Katsuhiko Murakami

Nikon Corporation

科研成果: 期刊稿件 › 文章 › 同行评审

18 引用（Scopus）

摘要

Detailed simulation of thermal and structural deformation and its impact on the optical performance of Nikon's 6-mirror projection optics was performed. The simulation employed the commercial software I-DEAS and CODE V, as well as in-house software. The results show that (a) the maximum temperature increase is 4.09°C in the smallest mirror, (b) the maximum thermal deformation at clear aperture is about 0.251 nm rms, and (c) the maximum nonspherical deformation at clear aperture is about 0.035 nm rms.

源语言	英语
页（从-至）	127-129
页数	3
期刊	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
卷	21
DOI	https://doi.org/10.1116/1.1534573
出版状态	已出版 - 2003
已对外发布	是

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@article{73bc7537ac8c45b88d969f79a952dd45,

title = "Thermal and structural deformation and its impact on optical performance of projection optics for extreme ultraviolet lithography",

abstract = "Detailed simulation of thermal and structural deformation and its impact on the optical performance of Nikon's 6-mirror projection optics was performed. The simulation employed the commercial software I-DEAS and CODE V, as well as in-house software. The results show that (a) the maximum temperature increase is 4.09°C in the smallest mirror, (b) the maximum thermal deformation at clear aperture is about 0.251 nm rms, and (c) the maximum nonspherical deformation at clear aperture is about 0.035 nm rms.",

author = "Yanqiu Li and Kazuya Ota and Katsuhiko Murakami",

year = "2003",

doi = "10.1116/1.1534573",

language = "English",

volume = "21",

pages = "127--129",

journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

}

TY - JOUR

T1 - Thermal and structural deformation and its impact on optical performance of projection optics for extreme ultraviolet lithography

AU - Li, Yanqiu

AU - Ota, Kazuya

AU - Murakami, Katsuhiko

PY - 2003

Y1 - 2003

N2 - Detailed simulation of thermal and structural deformation and its impact on the optical performance of Nikon's 6-mirror projection optics was performed. The simulation employed the commercial software I-DEAS and CODE V, as well as in-house software. The results show that (a) the maximum temperature increase is 4.09°C in the smallest mirror, (b) the maximum thermal deformation at clear aperture is about 0.251 nm rms, and (c) the maximum nonspherical deformation at clear aperture is about 0.035 nm rms.

AB - Detailed simulation of thermal and structural deformation and its impact on the optical performance of Nikon's 6-mirror projection optics was performed. The simulation employed the commercial software I-DEAS and CODE V, as well as in-house software. The results show that (a) the maximum temperature increase is 4.09°C in the smallest mirror, (b) the maximum thermal deformation at clear aperture is about 0.251 nm rms, and (c) the maximum nonspherical deformation at clear aperture is about 0.035 nm rms.

UR - http://www.scopus.com/inward/record.url?scp=0037207703&partnerID=8YFLogxK

U2 - 10.1116/1.1534573

DO - 10.1116/1.1534573

M3 - Article

AN - SCOPUS:0037207703

SN - 1071-1023

VL - 21

SP - 127

EP - 129

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

ER -

Thermal and structural deformation and its impact on optical performance of projection optics for extreme ultraviolet lithography

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