TY - JOUR
T1 - The realization of isotropic multiplexing diffraction patterns and polarization property by two-dimensional imprinting silica periodic photonic crystals
AU - Huang, Shiqi
AU - Ding, Chunjie
AU - Guo, Shuai
AU - Hao, Yan
AU - Zhang, Min
AU - Wang, Xianshuang
AU - Lu, Tianqi
AU - Xu, Xiangjun
AU - Li, Angze
AU - Deng, Yajing
AU - Liu, Ruibin
N1 - Publisher Copyright:
© 2018 Elsevier B.V.
PY - 2019/1
Y1 - 2019/1
N2 - Multiplexing optical devices realized by 2D photonic crystals is a feasible way and hot research topic. Especially, dielectric photonic crystals with isotropic multi-point far-filed diffraction patterns and high diffraction efficiency are essential for the development of multiplexing optical system in optical communication field. However, the fabrication of high quality photonic crystals based on SiO2 dielectric material with large surface area and strict periodicity remains a great challenge. This paper presents a single-step nanoimprint route to fabricate two-dimensional silica photonic nanostructures using silica sol-gel solution combined with substrate conformal imprint lithography (SCIL) technique. The imprinted silica photonic nanostructures, with strictly periodicity of cylindrical imprinted pattern and uniform aspect ratio in a glass substrate with 4 inches, have a good multi-channel diffraction performance in transmission mode and the transmission efficiency can be reached up to 80% at a broad wavelength band. Furthermore, the change of polarization direction in output multi diffraction beams is consistent with the variation of the polarization direction of the injected laser light, which shows potential application as multiplexing devices. The finding provides a low cost and fast imprint method to fabricate high quality 2D silica photonic nanostructures and their outstanding optical performance make them become important components or fundamental building blocks in integrated on chip optical or optoelectronic devices, such as light division multiplexing system.
AB - Multiplexing optical devices realized by 2D photonic crystals is a feasible way and hot research topic. Especially, dielectric photonic crystals with isotropic multi-point far-filed diffraction patterns and high diffraction efficiency are essential for the development of multiplexing optical system in optical communication field. However, the fabrication of high quality photonic crystals based on SiO2 dielectric material with large surface area and strict periodicity remains a great challenge. This paper presents a single-step nanoimprint route to fabricate two-dimensional silica photonic nanostructures using silica sol-gel solution combined with substrate conformal imprint lithography (SCIL) technique. The imprinted silica photonic nanostructures, with strictly periodicity of cylindrical imprinted pattern and uniform aspect ratio in a glass substrate with 4 inches, have a good multi-channel diffraction performance in transmission mode and the transmission efficiency can be reached up to 80% at a broad wavelength band. Furthermore, the change of polarization direction in output multi diffraction beams is consistent with the variation of the polarization direction of the injected laser light, which shows potential application as multiplexing devices. The finding provides a low cost and fast imprint method to fabricate high quality 2D silica photonic nanostructures and their outstanding optical performance make them become important components or fundamental building blocks in integrated on chip optical or optoelectronic devices, such as light division multiplexing system.
KW - Far field diffraction
KW - Multi-point diffraction
KW - Polarization
KW - SCIL
KW - ilica photonic crystal
UR - http://www.scopus.com/inward/record.url?scp=85054614878&partnerID=8YFLogxK
U2 - 10.1016/j.physe.2018.09.019
DO - 10.1016/j.physe.2018.09.019
M3 - Article
AN - SCOPUS:85054614878
SN - 1386-9477
VL - 105
SP - 202
EP - 206
JO - Physica E: Low-Dimensional Systems and Nanostructures
JF - Physica E: Low-Dimensional Systems and Nanostructures
ER -