摘要
The stacking effects on the electronic structure of van der Waals heterostructures consisting of silicene and hexagonal boron nitride are investigated by first-principles calculations. It is shown that the stacking is fundamental for the details of the dispersion relation in the vicinity of the Fermi energy (gapped, non-gapped, linear, parabolic) despite small differences in the total energy. It is also demonstrated that the tight-binding model of bilayer graphene is able to capture most of these features of the van der Waals heterostructures, and the limitations of the model are identified.
源语言 | 英语 |
---|---|
文章编号 | 1800083 |
期刊 | Advanced Theory and Simulations |
卷 | 1 |
期 | 11 |
DOI | |
出版状态 | 已出版 - 1 11月 2018 |
指纹
探究 'Stacking Effects in van der Waals Heterostructures of Silicene and Hexagonal Boron Nitride' 的科研主题。它们共同构成独一无二的指纹。引用此
Sattar, S., Zhang, Y., & Schwingenschlögl, U. (2018). Stacking Effects in van der Waals Heterostructures of Silicene and Hexagonal Boron Nitride. Advanced Theory and Simulations, 1(11), 文章 1800083. https://doi.org/10.1002/adts.201800083