@inproceedings{8c1728f3bb6c4f708f0dd3026b2cf544,
title = "Simulations of impacts on aerial image performance of defocus on different resolution enhancement technologies",
abstract = "As lithographic technology continues to advance, the size of nodes has continually been decreased while the control of defocus has become stringent in the actual lithography process. Defocus is always uncertain in the practical exposure process due to multi-factor impact, which is supposed to be considered as an important element of the aerial imaging model. It's necessary to analyze the influence of defocus on the aerial image. In this paper, aerial image approximates to a second-order polynomial for different defocus through Taylor series expansion. Then the respective and the joint impacts of the first-order defocus term and the second-order defocus term on aerial image for various conditions have been studied by simulation.",
keywords = "Aerial image, Defocus, Lithography performance, Taylor series expansion",
author = "Yaning Li and Yanqiu Li and Yiyu Sun and Pengzhi Wei",
note = "Publisher Copyright: {\textcopyright} 2021 COPYRIGHT SPIE.; 12th International Conference on Information Optics and Photonics, CIOP 2021 ; Conference date: 23-07-2021 Through 26-07-2021",
year = "2021",
doi = "10.1117/12.2606845",
language = "English",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Yue Yang",
booktitle = "Twelfth International Conference on Information Optics and Photonics, CIOP 2021",
address = "United States",
}