TY - JOUR
T1 - Simulation of plume UV radiation distributions at different altitudes
AU - Aiyan, Guo
AU - Tingzhu, Bai
AU - Yi, Tang
PY - 2009
Y1 - 2009
N2 - A 2-D model is developed for the simulation. Calculations take into account the chemiluminence reaction of CO-O, which is the dominant sources of radiation in the UV wavelength band considered, and particle emission\scattering effects produced by alumina particles. The alumina particle is considered as a discrete phase through the continuous flow, assumed to be in solid state with diameters ranging from 5 micron to 17 micron. The atmospheric effects, pressure and temperature, are included in the boundary condition. Four cases, altitudes at 0km, 4km, 15km and 30km are calculated separately, and comparisons are made with each other .Finally, the analysis of affecting factors is presented.
AB - A 2-D model is developed for the simulation. Calculations take into account the chemiluminence reaction of CO-O, which is the dominant sources of radiation in the UV wavelength band considered, and particle emission\scattering effects produced by alumina particles. The alumina particle is considered as a discrete phase through the continuous flow, assumed to be in solid state with diameters ranging from 5 micron to 17 micron. The atmospheric effects, pressure and temperature, are included in the boundary condition. Four cases, altitudes at 0km, 4km, 15km and 30km are calculated separately, and comparisons are made with each other .Finally, the analysis of affecting factors is presented.
KW - Altitude
KW - Plume radiation
KW - Solar blind uv
UR - http://www.scopus.com/inward/record.url?scp=62649106758&partnerID=8YFLogxK
U2 - 10.1117/12.811524
DO - 10.1117/12.811524
M3 - Conference article
AN - SCOPUS:62649106758
SN - 0277-786X
VL - 7156
JO - Proceedings of SPIE - The International Society for Optical Engineering
JF - Proceedings of SPIE - The International Society for Optical Engineering
M1 - 71560S
T2 - 2008 International Conference on Optical Instruments and Technology: Optical Systems and Optoelectronic Instruments
Y2 - 16 November 2008 through 19 November 2008
ER -