摘要
Vacuum stage is a key subsystem of Extreme Ultraviolet Lithography. Its accuracy, velocity, acceleration, as well as dynamic positioning and synchronous scanning performances affect the image quality, overlay accuracy and throughput of the whole machine greatly. Based on the working principles and state-of-the-art developments of EUVL, the characteristics, construction and key technologies for vacuum stage system of EUVL are investigated.
| 源语言 | 英语 |
|---|---|
| 页（从-至） | 32-37 |
| 页数 | 6 |
| 期刊 | Weixi Jiagong Jishu/Microfabrication Technology |
| 期 | 1 |
| 出版状态 | 已出版 - 3月 2005 |
| 已对外发布 | 是 |