Kinoshita, H., Watanabe, T., Li, Y., Miyafuji, A., Oshino, T., Sugisaki, K., Murakami, K., Irie, S., Shirayone, S., & Okazaki, S. (2000). Recent advances of 3-aspherical mirror system for EUVL. Proceedings of SPIE - The International Society for Optical Engineering, 3997, 70-75.
Kinoshita, H. ; Watanabe, T. ; Li, Y. 等. / Recent advances of 3-aspherical mirror system for EUVL. 在: Proceedings of SPIE - The International Society for Optical Engineering. 2000 ; 卷 3997. 页码 70-75.
@article{0b0d035deb814c478197ab1c661cc354,
title = "Recent advances of 3-aspherical mirror system for EUVL",
abstract = "A three-aspherical-mirror system for Extreme Ultraviolet Lithography has been developed. The aspherical mirrors were fabricated using the computer controlled optical surfacing (CCOS) process and a phase shift interferometer. The mirrors have a figure error of 0.58 nm and surface roughness of 0.3 nm. In order to obtain a high efficiency mirror, M1 and M2 were coated with a graded d-spacing Mo/Si multilayer and mirror M3 was coated with a uniform d-spacing Mo/Si multilayer. The peak reflectivity is 65% at the wavelength of 13.5 nm. The wavelength matching of each mirror spans 0.45 nm. The mirrors were aligned with a Fizeau-type phase shift interferometer, and a final wavefront error of less than 3 nm was achieved. Exposure experiments carried out at New Subaru synchrotron facility revealed that this system is capable of replicating a 56 nm pattern in a 10 mm×1 mm exposure field.",
author = "H. Kinoshita and T. Watanabe and Y. Li and A. Miyafuji and T. Oshino and K. Sugisaki and K. Murakami and S. Irie and S. Shirayone and S. Okazaki",
year = "2000",
language = "English",
volume = "3997",
pages = "70--75",
journal = "Proceedings of SPIE - The International Society for Optical Engineering",
issn = "0277-786X",
publisher = "SPIE",
note = "Emerging Lithographic Technologies IV ; Conference date: 28-02-2000 Through 01-03-2000",
}
Kinoshita, H, Watanabe, T, Li, Y, Miyafuji, A, Oshino, T, Sugisaki, K, Murakami, K, Irie, S, Shirayone, S & Okazaki, S 2000, 'Recent advances of 3-aspherical mirror system for EUVL', Proceedings of SPIE - The International Society for Optical Engineering, 卷 3997, 页码 70-75.
Recent advances of 3-aspherical mirror system for EUVL. / Kinoshita, H.; Watanabe, T.
; Li, Y. 等.
在:
Proceedings of SPIE - The International Society for Optical Engineering, 卷 3997, 2000, 页码 70-75.
科研成果: 期刊稿件 › 会议文章 › 同行评审
TY - JOUR
T1 - Recent advances of 3-aspherical mirror system for EUVL
AU - Kinoshita, H.
AU - Watanabe, T.
AU - Li, Y.
AU - Miyafuji, A.
AU - Oshino, T.
AU - Sugisaki, K.
AU - Murakami, K.
AU - Irie, S.
AU - Shirayone, S.
AU - Okazaki, S.
PY - 2000
Y1 - 2000
N2 - A three-aspherical-mirror system for Extreme Ultraviolet Lithography has been developed. The aspherical mirrors were fabricated using the computer controlled optical surfacing (CCOS) process and a phase shift interferometer. The mirrors have a figure error of 0.58 nm and surface roughness of 0.3 nm. In order to obtain a high efficiency mirror, M1 and M2 were coated with a graded d-spacing Mo/Si multilayer and mirror M3 was coated with a uniform d-spacing Mo/Si multilayer. The peak reflectivity is 65% at the wavelength of 13.5 nm. The wavelength matching of each mirror spans 0.45 nm. The mirrors were aligned with a Fizeau-type phase shift interferometer, and a final wavefront error of less than 3 nm was achieved. Exposure experiments carried out at New Subaru synchrotron facility revealed that this system is capable of replicating a 56 nm pattern in a 10 mm×1 mm exposure field.
AB - A three-aspherical-mirror system for Extreme Ultraviolet Lithography has been developed. The aspherical mirrors were fabricated using the computer controlled optical surfacing (CCOS) process and a phase shift interferometer. The mirrors have a figure error of 0.58 nm and surface roughness of 0.3 nm. In order to obtain a high efficiency mirror, M1 and M2 were coated with a graded d-spacing Mo/Si multilayer and mirror M3 was coated with a uniform d-spacing Mo/Si multilayer. The peak reflectivity is 65% at the wavelength of 13.5 nm. The wavelength matching of each mirror spans 0.45 nm. The mirrors were aligned with a Fizeau-type phase shift interferometer, and a final wavefront error of less than 3 nm was achieved. Exposure experiments carried out at New Subaru synchrotron facility revealed that this system is capable of replicating a 56 nm pattern in a 10 mm×1 mm exposure field.
UR - http://www.scopus.com/inward/record.url?scp=0033699244&partnerID=8YFLogxK
M3 - Conference article
AN - SCOPUS:0033699244
SN - 0277-786X
VL - 3997
SP - 70
EP - 75
JO - Proceedings of SPIE - The International Society for Optical Engineering
JF - Proceedings of SPIE - The International Society for Optical Engineering
T2 - Emerging Lithographic Technologies IV
Y2 - 28 February 2000 through 1 March 2000
ER -
Kinoshita H, Watanabe T, Li Y, Miyafuji A, Oshino T, Sugisaki K 等. Recent advances of 3-aspherical mirror system for EUVL. Proceedings of SPIE - The International Society for Optical Engineering. 2000;3997:70-75.