Plasmonic properties of titanium nitride thin films prepared by ion beam assisted deposition

Lin Ao Zhang; Hao Nan Liu; Xiao Xia Suo; Shuo Tong; Ying Lan Li; Zhao Tan Jiang; Zhi Wang

doi:10.1016/j.matlet.2016.08.147

Plasmonic properties of titanium nitride thin films prepared by ion beam assisted deposition

Lin Ao Zhang, Hao Nan Liu, Xiao Xia Suo, Shuo Tong, Ying Lan Li, Zhao Tan Jiang, Zhi Wang^*

^*此作品的通讯作者

物理学院

科研成果: 期刊稿件 › 文章 › 同行评审

20 引用（Scopus）

摘要

Titanium nitride (TiN_x) is regarded as a kind of promising plasmonic material for its high performances. We studied the influence of nitrogen partial pressure p_n and deposition temperature T_d on the structural and plasmonic properties of the TiN_x thin films prepared by ion beam assisted deposition (IBAD). The results show that IBAD is an effective method to tailor the plasmonic properties of TiN_x films in visible and near-IR region. The plasmonic properties of the films have significant T_d and p_n dependence. Higher p_n and lower T_d can reduce the plasma frequency and the plasmon resonance. Higher p_n and higher T_d can reduce the optical loss of the samples. The modification of the plasmonic properties is related to the variation of nitrogen content.

源语言	英语
页（从-至）	295-298
页数	4
期刊	Materials Letters
卷	185
DOI	https://doi.org/10.1016/j.matlet.2016.08.147
出版状态	已出版 - 15 12月 2016

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@article{111306f8bc6144678c75b07f5adb7914,

title = "Plasmonic properties of titanium nitride thin films prepared by ion beam assisted deposition",

abstract = "Titanium nitride (TiNx) is regarded as a kind of promising plasmonic material for its high performances. We studied the influence of nitrogen partial pressure pn and deposition temperature Td on the structural and plasmonic properties of the TiNx thin films prepared by ion beam assisted deposition (IBAD). The results show that IBAD is an effective method to tailor the plasmonic properties of TiNx films in visible and near-IR region. The plasmonic properties of the films have significant Td and pn dependence. Higher pn and lower Td can reduce the plasma frequency and the plasmon resonance. Higher pn and higher Td can reduce the optical loss of the samples. The modification of the plasmonic properties is related to the variation of nitrogen content.",

keywords = "Ion beam modification, Optical materials and properties, Plasmonics, Thin films, Titanium nitride",

author = "Zhang, {Lin Ao} and Liu, {Hao Nan} and Suo, {Xiao Xia} and Shuo Tong and Li, {Ying Lan} and Jiang, {Zhao Tan} and Zhi Wang",

note = "Publisher Copyright: {\textcopyright} 2016 Elsevier B.V.",

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doi = "10.1016/j.matlet.2016.08.147",

language = "English",

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T1 - Plasmonic properties of titanium nitride thin films prepared by ion beam assisted deposition

AU - Zhang, Lin Ao

AU - Liu, Hao Nan

AU - Suo, Xiao Xia

AU - Tong, Shuo

AU - Li, Ying Lan

AU - Jiang, Zhao Tan

AU - Wang, Zhi

PY - 2016/12/15

Y1 - 2016/12/15

N2 - Titanium nitride (TiNx) is regarded as a kind of promising plasmonic material for its high performances. We studied the influence of nitrogen partial pressure pn and deposition temperature Td on the structural and plasmonic properties of the TiNx thin films prepared by ion beam assisted deposition (IBAD). The results show that IBAD is an effective method to tailor the plasmonic properties of TiNx films in visible and near-IR region. The plasmonic properties of the films have significant Td and pn dependence. Higher pn and lower Td can reduce the plasma frequency and the plasmon resonance. Higher pn and higher Td can reduce the optical loss of the samples. The modification of the plasmonic properties is related to the variation of nitrogen content.

AB - Titanium nitride (TiNx) is regarded as a kind of promising plasmonic material for its high performances. We studied the influence of nitrogen partial pressure pn and deposition temperature Td on the structural and plasmonic properties of the TiNx thin films prepared by ion beam assisted deposition (IBAD). The results show that IBAD is an effective method to tailor the plasmonic properties of TiNx films in visible and near-IR region. The plasmonic properties of the films have significant Td and pn dependence. Higher pn and lower Td can reduce the plasma frequency and the plasmon resonance. Higher pn and higher Td can reduce the optical loss of the samples. The modification of the plasmonic properties is related to the variation of nitrogen content.

KW - Ion beam modification

KW - Optical materials and properties

KW - Plasmonics

KW - Thin films

KW - Titanium nitride

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DO - 10.1016/j.matlet.2016.08.147

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SN - 0167-577X

VL - 185

SP - 295

EP - 298

JO - Materials Letters

JF - Materials Letters

ER -

Plasmonic properties of titanium nitride thin films prepared by ion beam assisted deposition

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