Photolithography of colloidal quantum dots for display applications

Quantum dot (QD) light-emitting diodes (LEDs) are considered as a promising direction for next-generation display applications because of their excellent spectral purity, wide color gamut, and high brightness. However, developing a technology for high-resolution patterning of QDs remains challenging. This paper expounds the latest progress of QDs photolithography technology, including lift-off photolithography and direct photolithography technology. In the direct photolithography technology, we are focusing on the mixed photoresist and ligand engineering photolithography, we also introduce the progress of patterned QDs luminescence layer in photoluminescence and electroluminescence application. Finally, we provide the problems in QDs photolithography and our outlooks for potential future directions in the field of ultra-high resolution display.