TY - GEN
T1 - Option of resolution enhancement technology in advanced lithography
AU - Yanqiu, Li
AU - Yuan, Zhou
PY - 2007
Y1 - 2007
N2 - Hyper-numerical aperture ArF scanner has being designed to meet the needs of 45nm node. Resolution enhancement technology, such as phase shift mask, off-axis illumination, and innovation processing technology must be employed in hyper-numerical aperture ArF lithography. However the cross talk of phase shift mask, off axis illumination, polarization effect, and resist stack impacts lithography performance significantly. Option of resolution enhancement technology is presented in conjunction with optimal dual-layers bottom anti-refactive coating and polarized illumination by our program and Prolith 9.0. Multi options of resolution enhancement technology are obtained to maintain a small CD, good CD uniformity (CDU), reasonable process window (PW) and fidelity of resist profile.
AB - Hyper-numerical aperture ArF scanner has being designed to meet the needs of 45nm node. Resolution enhancement technology, such as phase shift mask, off-axis illumination, and innovation processing technology must be employed in hyper-numerical aperture ArF lithography. However the cross talk of phase shift mask, off axis illumination, polarization effect, and resist stack impacts lithography performance significantly. Option of resolution enhancement technology is presented in conjunction with optimal dual-layers bottom anti-refactive coating and polarized illumination by our program and Prolith 9.0. Multi options of resolution enhancement technology are obtained to maintain a small CD, good CD uniformity (CDU), reasonable process window (PW) and fidelity of resist profile.
KW - Antireflective coatings
KW - ArF lithography
KW - Polarization
KW - Resolution enhancement technology
UR - http://www.scopus.com/inward/record.url?scp=42149083751&partnerID=8YFLogxK
U2 - 10.1117/12.782511
DO - 10.1117/12.782511
M3 - Conference contribution
AN - SCOPUS:42149083751
SN - 9780819468819
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies
T2 - 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies, AOMATT 2007: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
Y2 - 8 July 2007 through 12 July 2007
ER -