Numerical simulation of chemical processes in helium plasmas in atmosphere environment

Jian Ming Ouyang; Wei Guo; Long Wang; Fu Qiu Shao

doi:10.1088/1009-1963/14/1/028

Numerical simulation of chemical processes in helium plasmas in atmosphere environment

Jian Ming Ouyang^*, Wei Guo, Long Wang, Fu Qiu Shao

^*此作品的通讯作者

科研成果: 期刊稿件 › 文章 › 同行评审

6 引用（Scopus）

摘要

A model is built to study chemical processes in plasmas generated in helium with trace amounts of air at atmospheric pressure or low pressures. The plasma lifetimes and the temporal evolutions of the main charged species are presented. The plasma lifetimes are longer than that in air plasma at atmospheric pressure, but this is not true at low pressures. The electron number density does not strictly obey the exponential damping law in a longer period.

源语言	英语
页（从-至）	154-158
页数	5
期刊	Chinese Physics
卷	14
期	1
DOI	https://doi.org/10.1088/1009-1963/14/1/028
出版状态	已出版 - 1月 2005
已对外发布	是

访问文件

10.1088/1009-1963/14/1/028

其它文件与链接

链接到 Scopus 的出版物

引用此

@article{e21e7e7d35b544508ec94ca7ecfc2107,

title = "Numerical simulation of chemical processes in helium plasmas in atmosphere environment",

abstract = "A model is built to study chemical processes in plasmas generated in helium with trace amounts of air at atmospheric pressure or low pressures. The plasma lifetimes and the temporal evolutions of the main charged species are presented. The plasma lifetimes are longer than that in air plasma at atmospheric pressure, but this is not true at low pressures. The electron number density does not strictly obey the exponential damping law in a longer period.",

keywords = "Chemical processes, Helium plasma, Lifetime",

author = "Ouyang, {Jian Ming} and Wei Guo and Long Wang and Shao, {Fu Qiu}",

year = "2005",

month = jan,

doi = "10.1088/1009-1963/14/1/028",

language = "English",

volume = "14",

pages = "154--158",

journal = "Chinese Physics",

issn = "1009-1963",

publisher = "IOP Publishing Ltd.",

number = "1",

}

TY - JOUR

T1 - Numerical simulation of chemical processes in helium plasmas in atmosphere environment

AU - Ouyang, Jian Ming

AU - Guo, Wei

AU - Wang, Long

AU - Shao, Fu Qiu

PY - 2005/1

Y1 - 2005/1

N2 - A model is built to study chemical processes in plasmas generated in helium with trace amounts of air at atmospheric pressure or low pressures. The plasma lifetimes and the temporal evolutions of the main charged species are presented. The plasma lifetimes are longer than that in air plasma at atmospheric pressure, but this is not true at low pressures. The electron number density does not strictly obey the exponential damping law in a longer period.

AB - A model is built to study chemical processes in plasmas generated in helium with trace amounts of air at atmospheric pressure or low pressures. The plasma lifetimes and the temporal evolutions of the main charged species are presented. The plasma lifetimes are longer than that in air plasma at atmospheric pressure, but this is not true at low pressures. The electron number density does not strictly obey the exponential damping law in a longer period.

KW - Chemical processes

KW - Helium plasma

KW - Lifetime

UR - http://www.scopus.com/inward/record.url?scp=24144447837&partnerID=8YFLogxK

U2 - 10.1088/1009-1963/14/1/028

DO - 10.1088/1009-1963/14/1/028

M3 - Article

AN - SCOPUS:24144447837

SN - 1009-1963

VL - 14

SP - 154

EP - 158

JO - Chinese Physics

JF - Chinese Physics

IS - 1

ER -

Numerical simulation of chemical processes in helium plasmas in atmosphere environment

摘要

访问文件

其它文件与链接

指纹

引用此