Modulation of the plasmonic characteristics of Ti-Zr ternary nitride thin films by assisting ions

Huiping Lu, Yujing Ran, Shujun Zhao, Qian Guo, Chang Gao, Zhaotan Jiang, Fan Yang, Zhi Wang*

*此作品的通讯作者

科研成果: 期刊稿件文章同行评审

11 引用 (Scopus)

摘要

Plasmonic Ti-Zr ternary nitride thin films, with ZrNx and TiNx thin films as controls, were prepared with bombardment of assisting ions. The effects of the energy (Ea) and current density (Ja) of assisting ions, on the structure and plasmonic properties of the Ti-Zr ternary nitride thin films were investigated. All the films are B1-structured with a mixed orientation of (1 1 1) and (2 2 0). Higher Ea leads to higher nitrogen content and reduced the titanium content. Higher Ja or Ea can reduce the plasmonic resonance frequency and reduce the energy loss. Moreover, the plasmonic quality factors of the films can also be modulated by Ea and Ja in a wide range. It is possible that the change of the conductivity mainly underly the Ion beam modification of the plasmonic characteristics. The results of this work give an effective method to tune the plasmonic performances of ternary nitride films in visible and near infrared region.

源语言英语
文章编号144579
期刊Applied Surface Science
505
DOI
出版状态已出版 - 1 3月 2020

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