摘要
In this paper, some novel micro/nano- moiré grating fabricating techniques are introduced. The gratings are produced by the SPM lithography, FIB lithography, and molecular beam epitaxy (MBE) method. The moiré patterns formed with these gratings are also introduced. The gratings are successfully to be used to measure the residual deformation in the surface around a step edge of the Al/Si artificial nanocluster with the moiré methods. The successful experimental results verify the feasibility of these methods.
源语言 | 英语 |
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文章编号 | 118 |
页(从-至) | 740-744 |
页数 | 5 |
期刊 | Proceedings of SPIE - The International Society for Optical Engineering |
卷 | 5852 PART II |
DOI | |
出版状态 | 已出版 - 2005 |
已对外发布 | 是 |
活动 | Third International Conference on Experimental Mechanics and Third Conference of the Asian Committee on Experimental Mechanics - Singapore, 新加坡 期限: 29 11月 2004 → 1 12月 2004 |