TY - JOUR
T1 - Interface-induced Berry-curvature dipole and second-order nonlinear Hall effect in two-dimensional Fe5GeTe2
AU - Zhong, Jinrui
AU - Peng, Huimin
AU - Wang, Xiaocui
AU - Feng, Qi
AU - Hu, Yuqing
AU - Li, Qiuli
AU - Li, Yongkai
AU - Jiang, Wei
AU - Wang, Zhiwei
AU - Duan, Junxi
N1 - Publisher Copyright:
© 2024 American Physical Society.
PY - 2024/2
Y1 - 2024/2
N2 - The second-order nonlinear Hall effect (NLHE), driven by the Berry-curvature dipole (BCD), quantum metrics, and disorder-related mechanisms, have potential in energy harvesting and signal doubling. However, for a large class of known materials, in which inversion symmetry is preserved, the BCD and NLHE are strictly zero. Here, we report that, by interface modulation through AlxO3-assisted exfoliation, a strong NLHE is generated in few-layer Fe5GeTe2, in which both the BCD and disorder-related contributions are in principle prohibited due to its R3¯m lattice symmetry. Scaling analysis indicates the existence of a large BCD reaching Λ≈150nm. The negative results from Fe5GeTe2 devices on SiO2 substrates confirm that the interface between Fe5GeTe2 and AlxO3 is responsible for the observed NLHE, revealing an interface-induced BCD, which has never been reported before. Our study provides a feasible way to generate NLHE in materials with inversion symmetry, expanding the material family for NLHE research and inspiring potential applications due to the advantages in mass production.
AB - The second-order nonlinear Hall effect (NLHE), driven by the Berry-curvature dipole (BCD), quantum metrics, and disorder-related mechanisms, have potential in energy harvesting and signal doubling. However, for a large class of known materials, in which inversion symmetry is preserved, the BCD and NLHE are strictly zero. Here, we report that, by interface modulation through AlxO3-assisted exfoliation, a strong NLHE is generated in few-layer Fe5GeTe2, in which both the BCD and disorder-related contributions are in principle prohibited due to its R3¯m lattice symmetry. Scaling analysis indicates the existence of a large BCD reaching Λ≈150nm. The negative results from Fe5GeTe2 devices on SiO2 substrates confirm that the interface between Fe5GeTe2 and AlxO3 is responsible for the observed NLHE, revealing an interface-induced BCD, which has never been reported before. Our study provides a feasible way to generate NLHE in materials with inversion symmetry, expanding the material family for NLHE research and inspiring potential applications due to the advantages in mass production.
UR - http://www.scopus.com/inward/record.url?scp=85185879300&partnerID=8YFLogxK
U2 - 10.1103/PhysRevApplied.21.024044
DO - 10.1103/PhysRevApplied.21.024044
M3 - Article
AN - SCOPUS:85185879300
SN - 2331-7019
VL - 21
JO - Physical Review Applied
JF - Physical Review Applied
IS - 2
M1 - 024044
ER -