@inproceedings{6d422e36e5244d5ebec60824c844652a,
title = "High efficiency graded multilayer coating design using least-square fitting for NA0.55 extreme ultraviolet lithography Objective",
abstract = "The EUV (extreme ultraviolet) lithography system use a wavelength of 13.5 nm (nearly x-ray level), which will be absorbed by most materials. Therefore, in this paper, a high efficiency graded multilayer design method with least-square fitting approach was proposed to realize a high reflectivity multilayer coating for an anamorphic magnification EUV lithography objective with NA of 0.55. In this method, the parameters of the graded multilayer were calculated quickly by the least-square fitting method. Then calculate the reflectivity of each mirror separately. The design results show that the average reflectivity of each mirror is more than 60%, and the peak-valley value of reflectivity of each mirror is less than 4%.",
keywords = "EUV lithography, graded multilayer, optical design",
author = "Xiaonan Zhong and Yue Ma and Xu Yan and Ke Liu and Yanqiu Li",
note = "Publisher Copyright: {\textcopyright} 2022 IEEE.; 6th International Workshop on Advanced Patterning Solutions, IWAPS 2022 ; Conference date: 21-10-2022 Through 22-10-2022",
year = "2022",
doi = "10.1109/IWAPS57146.2022.9972249",
language = "English",
series = "IWAPS 2022 - 2022 6th International Workshop on Advanced Patterning Solutions",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
editor = "Yayi Wei and Tianchun Ye",
booktitle = "IWAPS 2022 - 2022 6th International Workshop on Advanced Patterning Solutions",
address = "United States",
}