@inproceedings{542c53c5d80042eba4550d22c071a5e9,
title = "Fast mask near-field calculation using fully convolution network",
abstract = "Near-field calculation for thick mask is a fundamental task in lithography simulations. This paper proposes a fully convolution network (FCN) method to improve the efficiency of three-dimensional (3D) mask near-field calculation compared to the rigorous electromagnetic field (EMF) simulation methods. Taking into account the 3D mask effects, the network is trained based on a set of mask samples and the corresponding near-field data obtained by the EMF simulator. During the testing stage, the trained FCN is used to rapidly predict the diffraction near-field of the testing mask patterns. The performance of the proposed FCN approach is evaluated by simulations based on EUV lithography.",
keywords = "3D mask effect, deep learning, diffraction near-field, fully convolution network, machine learning",
author = "Jiaxin Lin and Lisong Dong and Taian Fan and Xu Ma and Rui Chen and Yayi Wei",
note = "Publisher Copyright: {\textcopyright} 2020 IEEE.; 4th International Workshop on Advanced Patterning Solutions, IWAPS 2020 ; Conference date: 05-11-2020 Through 06-11-2020",
year = "2020",
month = nov,
day = "5",
doi = "10.1109/IWAPS51164.2020.9286805",
language = "English",
series = "2020 4th International Workshop on Advanced Patterning Solutions, IWAPS 2020",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
editor = "Yayi Wei and Tianchun Ye",
booktitle = "2020 4th International Workshop on Advanced Patterning Solutions, IWAPS 2020",
address = "United States",
}