Elastic scattering model for electron-beam lithography simulation

Guo Rong Zhao*, Yan Qiu Li

*此作品的通讯作者

科研成果: 期刊稿件文章同行评审

摘要

The conventional Rutherford elastic scattering model is not suitable to describe the elastic interaction between electron and higher atomic number (Z>4) materials. A new model based on non-relativistic wave equation of Schrodinger was presented, in which the atomic potential was Thomas-Fermi-Dirac (TFD) potential. The elastic scattering cross-sections of elements H, Li, C, O, Si were calculated by the new model and the results were compared to those of Rutherford elastic scattering model and precise elastic scattering model-Mott cross-section model. It was found that under the condition of higher incident electron energy (E>5 keV) and higher atomic number (Z>4), the results of the new model approaches that of Mott cross-section, more than that of Rutherford elastic scattering model, so it can make a decision that the new model is more precise and it is suitable to describe the elastic interaction between higher energy electrons and higher atomic number (Z>4) materials. Furthermore, the new model was corrected by the relativistic theory. The results show that when the incident electron energy is up to 100 keV, the relativistic effect is remarkable.

源语言英语
页(从-至)8-11
页数4
期刊Weixi Jiagong Jishu/Microfabrication Technology
2
出版状态已出版 - 4月 2006
已对外发布

指纹

探究 'Elastic scattering model for electron-beam lithography simulation' 的科研主题。它们共同构成独一无二的指纹。

引用此