Dispersion and stability of SiC ceramic slurry for stereolithography

Guojiao Ding; Rujie He; Keqiang Zhang; Min Xia; Chengwei Feng; Daining Fang

doi:10.1016/j.ceramint.2019.10.203

Dispersion and stability of SiC ceramic slurry for stereolithography

Guojiao Ding, Rujie He^*, Keqiang Zhang, Min Xia, Chengwei Feng, Daining Fang

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154 引用（Scopus）

摘要

Stereolithography based additive manufacturing provides an effective method to fabricate complex-shaped SiC ceramic components. The dispersion and stability of the ceramic slurry are very important for stereolithography. In this study, the dispersion and stability of SiC ceramic slurries were investigated systematically. The effects of resin monomers, dispersants, particle size, solid loading and ball milling time on the dispersion, rheological behavior and stability of SiC ceramic slurries were studied in detail. Finally, an optimal SiC ceramic slurry for stereolithography based additive manufacturing was obtained, and complex-shaped SiC ceramic architectures were fabricated.

源语言	英语
页（从-至）	4720-4729
页数	10
期刊	Ceramics International
卷	46
期	4
DOI	https://doi.org/10.1016/j.ceramint.2019.10.203
出版状态	已出版 - 3月 2020

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title = "Dispersion and stability of SiC ceramic slurry for stereolithography",

abstract = "Stereolithography based additive manufacturing provides an effective method to fabricate complex-shaped SiC ceramic components. The dispersion and stability of the ceramic slurry are very important for stereolithography. In this study, the dispersion and stability of SiC ceramic slurries were investigated systematically. The effects of resin monomers, dispersants, particle size, solid loading and ball milling time on the dispersion, rheological behavior and stability of SiC ceramic slurries were studied in detail. Finally, an optimal SiC ceramic slurry for stereolithography based additive manufacturing was obtained, and complex-shaped SiC ceramic architectures were fabricated.",

keywords = "Additive manufacturing, Dispersion, Silicon carbide, Stability, Stereolithography",

author = "Guojiao Ding and Rujie He and Keqiang Zhang and Min Xia and Chengwei Feng and Daining Fang",

note = "Publisher Copyright: {\textcopyright} 2019 Elsevier Ltd and Techna Group S.r.l.",

year = "2020",

month = mar,

doi = "10.1016/j.ceramint.2019.10.203",

language = "English",

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T1 - Dispersion and stability of SiC ceramic slurry for stereolithography

AU - Ding, Guojiao

AU - He, Rujie

AU - Zhang, Keqiang

AU - Xia, Min

AU - Feng, Chengwei

AU - Fang, Daining

PY - 2020/3

Y1 - 2020/3

N2 - Stereolithography based additive manufacturing provides an effective method to fabricate complex-shaped SiC ceramic components. The dispersion and stability of the ceramic slurry are very important for stereolithography. In this study, the dispersion and stability of SiC ceramic slurries were investigated systematically. The effects of resin monomers, dispersants, particle size, solid loading and ball milling time on the dispersion, rheological behavior and stability of SiC ceramic slurries were studied in detail. Finally, an optimal SiC ceramic slurry for stereolithography based additive manufacturing was obtained, and complex-shaped SiC ceramic architectures were fabricated.

AB - Stereolithography based additive manufacturing provides an effective method to fabricate complex-shaped SiC ceramic components. The dispersion and stability of the ceramic slurry are very important for stereolithography. In this study, the dispersion and stability of SiC ceramic slurries were investigated systematically. The effects of resin monomers, dispersants, particle size, solid loading and ball milling time on the dispersion, rheological behavior and stability of SiC ceramic slurries were studied in detail. Finally, an optimal SiC ceramic slurry for stereolithography based additive manufacturing was obtained, and complex-shaped SiC ceramic architectures were fabricated.

KW - Additive manufacturing

KW - Dispersion

KW - Silicon carbide

KW - Stability

KW - Stereolithography

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DO - 10.1016/j.ceramint.2019.10.203

M3 - Article

AN - SCOPUS:85074424359

SN - 0272-8842

VL - 46

SP - 4720

EP - 4729

JO - Ceramics International

JF - Ceramics International

IS - 4

ER -

Dispersion and stability of SiC ceramic slurry for stereolithography

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