Development of the large field extreme ultraviolet lithography camera

T. Watanabe; H. Kinoshita; H. Nii; Y. Li; K. Hamamoto; T. Oshino; K. Sugisaki; K. Murakami; S. Irie; S. Shirayone; Y. Gomei; S. Okazaki

doi:10.1116/1.1319712

Development of the large field extreme ultraviolet lithography camera

T. Watanabe^*, H. Kinoshita, H. Nii, Y. Li, K. Hamamoto, T. Oshino, K. Sugisaki, K. Murakami, S. Irie, S. Shirayone, Y. Gomei, S. Okazaki

^*此作品的通讯作者

科研成果: 期刊稿件 › 会议文章 › 同行评审

21 引用（Scopus）

摘要

The development of three-spherical-mirror optical system was presented. The mirrors were fabricated by phase shift interferometers. The wavefronts with error less than 3 nm was obtained. The results showed the fabrication of large scale integration circuits.

源语言	英语
页（从-至）	2905-2910
页数	6
期刊	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
卷	18
期	6
DOI	https://doi.org/10.1116/1.1319712
出版状态	已出版 - 11月 2000
已对外发布	是
活动	44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication - Rancho Mirage, CA, USA 期限: 30 5月 2000 → 2 6月 2000

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title = "Development of the large field extreme ultraviolet lithography camera",

abstract = "The development of three-spherical-mirror optical system was presented. The mirrors were fabricated by phase shift interferometers. The wavefronts with error less than 3 nm was obtained. The results showed the fabrication of large scale integration circuits.",

author = "T. Watanabe and H. Kinoshita and H. Nii and Y. Li and K. Hamamoto and T. Oshino and K. Sugisaki and K. Murakami and S. Irie and S. Shirayone and Y. Gomei and S. Okazaki",

year = "2000",

month = nov,

doi = "10.1116/1.1319712",

language = "English",

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pages = "2905--2910",

journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

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note = "44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication ; Conference date: 30-05-2000 Through 02-06-2000",

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Watanabe, T, Kinoshita, H, Nii, H, Li, Y, Hamamoto, K, Oshino, T, Sugisaki, K, Murakami, K, Irie, S, Shirayone, S, Gomei, Y & Okazaki, S 2000, 'Development of the large field extreme ultraviolet lithography camera', Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 卷 18, 号码 6, 页码 2905-2910. https://doi.org/10.1116/1.1319712

TY - JOUR

T1 - Development of the large field extreme ultraviolet lithography camera

AU - Watanabe, T.

AU - Kinoshita, H.

AU - Nii, H.

AU - Li, Y.

AU - Hamamoto, K.

AU - Oshino, T.

AU - Sugisaki, K.

AU - Murakami, K.

AU - Irie, S.

AU - Shirayone, S.

AU - Gomei, Y.

AU - Okazaki, S.

PY - 2000/11

Y1 - 2000/11

N2 - The development of three-spherical-mirror optical system was presented. The mirrors were fabricated by phase shift interferometers. The wavefronts with error less than 3 nm was obtained. The results showed the fabrication of large scale integration circuits.

AB - The development of three-spherical-mirror optical system was presented. The mirrors were fabricated by phase shift interferometers. The wavefronts with error less than 3 nm was obtained. The results showed the fabrication of large scale integration circuits.

UR - http://www.scopus.com/inward/record.url?scp=0034317842&partnerID=8YFLogxK

U2 - 10.1116/1.1319712

DO - 10.1116/1.1319712

M3 - Conference article

AN - SCOPUS:0034317842

SN - 1071-1023

VL - 18

SP - 2905

EP - 2910

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

IS - 6

T2 - 44th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication

Y2 - 30 May 2000 through 2 June 2000

ER -

Development of the large field extreme ultraviolet lithography camera

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