摘要
The production of extreme ultraviolet (EUV) was introduced. Simultaneously, the development of the laser produced plasma (LPP) sources was systemically described and the last development of Cymer's LPP sources for EUV lithography was reviewed in detail. Finally, a summary was given and some prospects for EUV source research were proposed.
| 源语言 | 英语 |
|---|---|
| 页（从-至） | 1-7+12 |
| 期刊 | Weixi Jiagong Jishu/Microfabrication Technology |
| 期 | 5 |
| 出版状态 | 已出版 - 10月 2006 |
| 已对外发布 | 是 |