Development of laser produced plasma source for EUV lithography

Fu Chang Zhang; Yan Qiu Li

Development of laser produced plasma source for EUV lithography

Fu Chang Zhang^*, Yan Qiu Li

^*此作品的通讯作者

CAS - Institute of Electrical Engineering

科研成果: 期刊稿件 › 文章 › 同行评审

5 引用（Scopus）

摘要

The production of extreme ultraviolet (EUV) was introduced. Simultaneously, the development of the laser produced plasma (LPP) sources was systemically described and the last development of Cymer's LPP sources for EUV lithography was reviewed in detail. Finally, a summary was given and some prospects for EUV source research were proposed.

源语言	英语
页（从-至）	1-7+12
期刊	Weixi Jiagong Jishu/Microfabrication Technology
期	5
出版状态	已出版 - 10月 2006
已对外发布	是

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引用此

Zhang, F. C., & Li, Y. Q. (2006). Development of laser produced plasma source for EUV lithography. Weixi Jiagong Jishu/Microfabrication Technology, (5), 1-7+12.

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title = "Development of laser produced plasma source for EUV lithography",

abstract = "The production of extreme ultraviolet (EUV) was introduced. Simultaneously, the development of the laser produced plasma (LPP) sources was systemically described and the last development of Cymer's LPP sources for EUV lithography was reviewed in detail. Finally, a summary was given and some prospects for EUV source research were proposed.",

keywords = "Debris contamination, EUV lithography, EUV power, LPP",

author = "Zhang, {Fu Chang} and Li, {Yan Qiu}",

year = "2006",

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AU - Zhang, Fu Chang

AU - Li, Yan Qiu

PY - 2006/10

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AB - The production of extreme ultraviolet (EUV) was introduced. Simultaneously, the development of the laser produced plasma (LPP) sources was systemically described and the last development of Cymer's LPP sources for EUV lithography was reviewed in detail. Finally, a summary was given and some prospects for EUV source research were proposed.

KW - Debris contamination

KW - EUV lithography

KW - EUV power

KW - LPP

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M3 - Article

AN - SCOPUS:34249996782

SN - 1003-8213

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JO - Weixi Jiagong Jishu/Microfabrication Technology

JF - Weixi Jiagong Jishu/Microfabrication Technology

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Development of laser produced plasma source for EUV lithography

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