@inproceedings{974e3e87965b4cad92d56bcf662b5ba3,
title = "Design of A Large Field of View High Numerical Aperture Extreme Ultraviolet Lithography Illumination System",
abstract = "The illumination system of extreme ultraviolet lithography (EUVL) is the core of extreme ultraviolet lithography. The illumination system is responsible for providing a variety of complex off-axis illumination modes, and illuminating the mask with high uniformity. In this paper, a design of high numerical aperture (NA) anamorphic EUV illumination system with large field of view is completed. Simulation results show that the system can satisfied the requirements of high uniformity on the mask under different illumination modes.",
keywords = "Extreme Ultraviolet Lithography, Illumination System Design, Large field of view",
author = "Xinyi Zhang and Yuqing Chen and Yanbei Nan and Yanqiu Li",
note = "Publisher Copyright: {\textcopyright} 2023 IEEE.; 7th International Workshop on Advanced Patterning Solutions, IWAPS 2023 ; Conference date: 26-10-2023 Through 27-10-2023",
year = "2023",
doi = "10.1109/IWAPS60466.2023.10366157",
language = "English",
series = "IWAPS 2023 - 2023 7th International Workshop on Advanced Patterning Solutions",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
editor = "Yayi Wei and Tianchun Ye",
booktitle = "IWAPS 2023 - 2023 7th International Workshop on Advanced Patterning Solutions",
address = "United States",
}