Design and performance characterization of a quartz crystal micro-retarder array

Ye Wang, Yanqiu Li*, Ke Liu, Jianhui Li, Guodong Zhou

*此作品的通讯作者

科研成果: 书/报告/会议事项章节会议稿件同行评审

摘要

Recently, micro-retarder arrays consisting of patterned liquid crystal polymer or sub-wavelength grating arrays with four different orientations are widely used in division of focal planeï1/4DOFPï1/4‰Stokes polarimeters. However, due to thermal sensitivity of liquid crystal, real-Time calibration of the instruments is required to achieve high-precision detection under non-isothermal conditions. Sub-wavelength grating arrays require sophisticated process, and the study of the influence of grating structure errors on measurement accuracy has been rarely reported. To overcome these limitations, we design a quartz crystal micro-retarder array for DOFP full-Stokes polarimeter, which is composed of identical units with different retardances at four neighboring pixels. The retardance errors introduced by the errors of the substrate thickness (t) and etching depth (d) of the micro-retarder array are analyzed. Furthermore, the relationship among the measurement error, the instrument matrix error of Stokes polarimeter, and polarization state of incident light is established. Hereby, the influence of retardance error on the measurement error corresponding to incident light of different polarization state is analyzed. To reduce the measurement error of Stokes parameters to less than 0.02, the tolerances of t and d should be less than 0.11 μm and 0.09 μm, respectively. The micro-retarder array on quartz crystal is fabricated according to our design and tolerances analysis. Finally, the retardance characteristics of the micro-retarder arrays are characterized by the high accuracy (0.1%) Mueller polarimeter developed in house.

源语言英语
主期刊名2019 International Conference on Optical Instruments and Technology
主期刊副标题Optoelectronic Measurement Technology and Systems
编辑Jigui Zhu, Kexin Xu, Hai Xiao, Sen Han
出版商SPIE
ISBN(电子版)9781510636569
DOI
出版状态已出版 - 2020
活动2019 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems - Beijing, 中国
期限: 26 10月 201928 10月 2019

出版系列

姓名Proceedings of SPIE - The International Society for Optical Engineering
11439
ISSN(印刷版)0277-786X
ISSN(电子版)1996-756X

会议

会议2019 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems
国家/地区中国
Beijing
时期26/10/1928/10/19

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