@inproceedings{c975432767e1468f80cf500061c522a5,
title = "Design and analysis of deep-ultraviolet micro-lithography illumination system",
abstract = "To achieve high uniformity in large area on the mask of deep ultraviolet micro-lithography lens, a deep study of DUV micro-lithography illumination system is expanded in both theoretical and experimental aspects in this paper. Characters of different illumination structures and mode are introduced. Then an applicable illumination mode according to the requirements is selected. At the same time, two kinds of removing the uneven illumination ways-fly-eyes and optical tunnel are studied. After that, according to the large numerical aperture requirement, a refractive illumination system is designed with software ZEMAX. In this system, methods are used to reduce the number of the aspherical mirrors. The system is optimized to meet the requirement of large illumination area on the mask. Then by using the software of TracePro, the optimized system modeling and calculate illuminance on image plane are created and the uniformity of the image plane is analysised. The result shows that the uniformity of the image plane and the size of light spot basically satisfied the requirements, and having great feasibility in DUV micro-lithography illumination system.",
keywords = "DUV, Design, Illumination system, Micro-lithography",
author = "Xing Han and Lin Li and Yifan Huang and Baolin Du and Bin Ma and Zihui Che",
year = "2010",
doi = "10.1117/12.866224",
language = "English",
isbn = "9780819480873",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
booktitle = "5th International Symposium on Advanced Optical Manufacturing and Testing Technologies",
note = "5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems ; Conference date: 26-04-2010 Through 29-04-2010",
}