Erbas, B., Conde-Rubio, A., Liu, X., Pernollet, J., Wang, Z., Bertsch, A., Penedo, M., Fantner, G., Banerjee, M., Kis, A., Boero, G., & Brugger, J. (2024). Combining thermal scanning probe lithography and dry etching for grayscale nanopattern amplification. Microsystems and Nanoengineering, 10(1), 文章 28. https://doi.org/10.1038/s41378-024-00655-y
Erbas, Berke ; Conde-Rubio, Ana ; Liu, Xia 等. / Combining thermal scanning probe lithography and dry etching for grayscale nanopattern amplification. 在: Microsystems and Nanoengineering. 2024 ; 卷 10, 号码 1.
@article{60ed435f48d4429189b340f5e88dbcbe,
title = "Combining thermal scanning probe lithography and dry etching for grayscale nanopattern amplification",
abstract = "Grayscale structured surfaces with nanometer-scale features are used in a growing number of applications in optics and fluidics. Thermal scanning probe lithography achieves a lateral resolution below 10 nm and a vertical resolution below 1 nm, but its maximum depth in polymers is limited. Here, we present an innovative combination of nanowriting in thermal resist and plasma dry etching with substrate cooling, which achieves up to 10-fold amplification of polymer nanopatterns into SiO2 without proportionally increasing surface roughness. Sinusoidal nanopatterns in SiO2 with 400 nm pitch and 150 nm depth are fabricated free of shape distortion after dry etching. To exemplify the possible applications of the proposed method, grayscale dielectric nanostructures are used for scalable manufacturing through nanoimprint lithography and for strain nanoengineering of 2D materials. Such a method for aspect ratio amplification and smooth grayscale nanopatterning has the potential to find application in the fabrication of photonic and nanoelectronic devices. (Figure presented.).",
author = "Berke Erbas and Ana Conde-Rubio and Xia Liu and Joffrey Pernollet and Zhenyu Wang and Arnaud Bertsch and Marcos Penedo and Georg Fantner and Mitali Banerjee and Andras Kis and Giovanni Boero and Juergen Brugger",
note = "Publisher Copyright: {\textcopyright} The Author(s) 2024.",
year = "2024",
month = dec,
doi = "10.1038/s41378-024-00655-y",
language = "English",
volume = "10",
journal = "Microsystems and Nanoengineering",
issn = "2055-7434",
publisher = "Nature Publishing Group",
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Erbas, B, Conde-Rubio, A, Liu, X, Pernollet, J, Wang, Z, Bertsch, A, Penedo, M, Fantner, G, Banerjee, M, Kis, A, Boero, G & Brugger, J 2024, 'Combining thermal scanning probe lithography and dry etching for grayscale nanopattern amplification', Microsystems and Nanoengineering, 卷 10, 号码 1, 28. https://doi.org/10.1038/s41378-024-00655-y
Combining thermal scanning probe lithography and dry etching for grayscale nanopattern amplification. / Erbas, Berke; Conde-Rubio, Ana
; Liu, Xia 等.
在:
Microsystems and Nanoengineering, 卷 10, 号码 1, 28, 12.2024.
科研成果: 期刊稿件 › 文章 › 同行评审
TY - JOUR
T1 - Combining thermal scanning probe lithography and dry etching for grayscale nanopattern amplification
AU - Erbas, Berke
AU - Conde-Rubio, Ana
AU - Liu, Xia
AU - Pernollet, Joffrey
AU - Wang, Zhenyu
AU - Bertsch, Arnaud
AU - Penedo, Marcos
AU - Fantner, Georg
AU - Banerjee, Mitali
AU - Kis, Andras
AU - Boero, Giovanni
AU - Brugger, Juergen
N1 - Publisher Copyright:
© The Author(s) 2024.
PY - 2024/12
Y1 - 2024/12
N2 - Grayscale structured surfaces with nanometer-scale features are used in a growing number of applications in optics and fluidics. Thermal scanning probe lithography achieves a lateral resolution below 10 nm and a vertical resolution below 1 nm, but its maximum depth in polymers is limited. Here, we present an innovative combination of nanowriting in thermal resist and plasma dry etching with substrate cooling, which achieves up to 10-fold amplification of polymer nanopatterns into SiO2 without proportionally increasing surface roughness. Sinusoidal nanopatterns in SiO2 with 400 nm pitch and 150 nm depth are fabricated free of shape distortion after dry etching. To exemplify the possible applications of the proposed method, grayscale dielectric nanostructures are used for scalable manufacturing through nanoimprint lithography and for strain nanoengineering of 2D materials. Such a method for aspect ratio amplification and smooth grayscale nanopatterning has the potential to find application in the fabrication of photonic and nanoelectronic devices. (Figure presented.).
AB - Grayscale structured surfaces with nanometer-scale features are used in a growing number of applications in optics and fluidics. Thermal scanning probe lithography achieves a lateral resolution below 10 nm and a vertical resolution below 1 nm, but its maximum depth in polymers is limited. Here, we present an innovative combination of nanowriting in thermal resist and plasma dry etching with substrate cooling, which achieves up to 10-fold amplification of polymer nanopatterns into SiO2 without proportionally increasing surface roughness. Sinusoidal nanopatterns in SiO2 with 400 nm pitch and 150 nm depth are fabricated free of shape distortion after dry etching. To exemplify the possible applications of the proposed method, grayscale dielectric nanostructures are used for scalable manufacturing through nanoimprint lithography and for strain nanoengineering of 2D materials. Such a method for aspect ratio amplification and smooth grayscale nanopatterning has the potential to find application in the fabrication of photonic and nanoelectronic devices. (Figure presented.).
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DO - 10.1038/s41378-024-00655-y
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JO - Microsystems and Nanoengineering
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Erbas B, Conde-Rubio A, Liu X, Pernollet J, Wang Z, Bertsch A 等. Combining thermal scanning probe lithography and dry etching for grayscale nanopattern amplification. Microsystems and Nanoengineering. 2024 12月;10(1):28. doi: 10.1038/s41378-024-00655-y