摘要
A super lens system is proposed to achieve subdiffraction limit demagnification imaging. The super lens system consists of a hyperlens with planar input and output surfaces, a metal superlens, and a plasmonic reflector. By employing the hyperlens to transform evanescent waves into propagating waves and employing the metal superlens and the plasmonic reflector to amplify evanescent waves, the super lens system can produce a subdiffraction limit image with relatively high electric field intensity. The reduction factor of the super lens system depends on the geometric parameters of the hyperlens. Simulation results show that an image with a half-pitch resolution of about one tenth the operating wavelength and a reduction factor of about 2.2 can be produced by the super lens system. The proposed super lens system has potential applications in nanolithography.
源语言 | 英语 |
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页(从-至) | 1543-1550 |
页数 | 8 |
期刊 | Plasmonics |
卷 | 8 |
期 | 4 |
DOI | |
出版状态 | 已出版 - 12月 2013 |