A polarization-based method for extracting phase from dual-frame interferograms

Zhibo Hu, Weirui Zhao*

*此作品的通讯作者

科研成果: 书/报告/会议事项章节会议稿件同行评审

摘要

Interference measurement is a high-precision detection method for evaluating optical components and beam quality. Interferometry is commonly used for an optical element surface accurate test. But it is susceptible to interference from environmental and phase ambiguity issues. So a polarization-based method for extracting phase from dual-frame interferograms is proposed. We put forward a polarization-based method for extracting phase from dual-frame interferograms. This method only requires two interferograms with a phase difference of pi/2, which are processed using the extremum method and directly subjected to tangent and arctangent phase extraction to recover the surface shape. It enables simple and efficient extraction of the phase distribution of the tested optical element surface to be realized in a sub-millimeter scale dynamic range with a nanometer accuracy. The present invention does not require high-precision components such as phase shifters and spectrometers, and does not require preprocessing operations such as normalization and denoising of interferograms. It has the advantages of simple optical path, large measurement range, high accuracy, and high efficiency.

源语言英语
主期刊名Optical Metrology and Inspection for Industrial Applications XI
编辑Sen Han, Sen Han, Gerd Ehret, Benyong Chen
出版商SPIE
ISBN(电子版)9781510682108
DOI
出版状态已出版 - 2024
活动Optical Metrology and Inspection for Industrial Applications XI 2024 - Nantong, 中国
期限: 12 10月 202414 10月 2024

出版系列

姓名Proceedings of SPIE - The International Society for Optical Engineering
13241
ISSN(印刷版)0277-786X
ISSN(电子版)1996-756X

会议

会议Optical Metrology and Inspection for Industrial Applications XI 2024
国家/地区中国
Nantong
时期12/10/2414/10/24

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