86% TMR at 4.2 K for amorphous magnetic-tunnel-junctions with Co60Fe20B20 as free and pinned layers

Feifei Li, Xiufeng Han*, Lixian Jiang, Jing Zhao, Lei Wang, Rehana Sharif

*此作品的通讯作者

科研成果: 期刊稿件文章同行评审

2 引用 (Scopus)

摘要

Single barrier magnetic-tunnel-junctions (MTJs) with the layer structure of Ta(5)/Cu(30)/Ta(5)/Ni79Fe21(5)/Ir22 Mn78(12)/Co60Fe20B20(4)/ Al(0.8)-oxide/Co60Fe20B20(4)/ Cu(30)/Ta(5) [thickness unit: nm] using the amorphous Co60Fe20B20 alloy as free and pinned layers were micro-fabricated. The experimental investigations showed that the tunnel magnetoresistance (TMR) ratio and the resistance decrease with increasing dc bias voltage from 0 to 500 mV or with increasing temperature from 4.2 K to RT. A high TMR ratio of 86.2% at 4.2 K, which corresponds to the high spin polarization of Co60Fe20B20, 55%, was observed in the MTJs after annealing at 270°C for 1 h. High TMR ratio of 53.1%, low junction resistance-area product RS of 3.56 kΩμm2, small coercivity HC of ≤Oe, and relatively large bias-voltage-at-half-maximum TMR with the value V1/2 of greater than 570 mV at RT have been achieved in such Co-Fe-B MTJs.

源语言英语
页(从-至)289-291
页数3
期刊Journal of Materials Science and Technology
21
3
出版状态已出版 - 5月 2005
已对外发布

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Li, F., Han, X., Jiang, L., Zhao, J., Wang, L., & Sharif, R. (2005). 86% TMR at 4.2 K for amorphous magnetic-tunnel-junctions with Co60Fe20B20 as free and pinned layers. Journal of Materials Science and Technology, 21(3), 289-291.