TY - JOUR
T1 - Thickness-dependent electrical properties of sol-gel derived Pb(Zr 0.52Ti0.48)O3 thick films using PbTiO 3 buffer layers
AU - Zhao, Quanliang
AU - Su, Dezhi
AU - Cao, Maosheng
AU - He, Guangping
AU - Di, Jiejian
AU - Yuan, Junjie
AU - Wang, Dawei
PY - 2013/9
Y1 - 2013/9
N2 - Pb(Zr0.52Ti0.48)O3 (PZT) thick films, with thickness up to 4 μm, using PbTiO3 (PT) buffer layers were successfully prepared on silicon-based substrates by a sol-gel method. Thermal analysis (thermogravimetric-differential thermal analysis) of PT and PZT sols were used to determine the pyrolysis and annealing temperatures. X-ray diffraction results show that the PZT/PT composite thick films possess perovskite structure and the dominant crystalline orientation changes from (100) to (110) with increasing the film thickness. Furthermore, the composite thick films exhibit thickness-dependent ferroelectric and dielectric properties, i.e., the coercive field decreases while dielectric constant increases as the thickness increases. Theoretical analysis shows that the thickness-dependent electrical properties are mainly attributed to the low dielectric constant of PT buffer layer and the relaxation of internal stress in PZT films.
AB - Pb(Zr0.52Ti0.48)O3 (PZT) thick films, with thickness up to 4 μm, using PbTiO3 (PT) buffer layers were successfully prepared on silicon-based substrates by a sol-gel method. Thermal analysis (thermogravimetric-differential thermal analysis) of PT and PZT sols were used to determine the pyrolysis and annealing temperatures. X-ray diffraction results show that the PZT/PT composite thick films possess perovskite structure and the dominant crystalline orientation changes from (100) to (110) with increasing the film thickness. Furthermore, the composite thick films exhibit thickness-dependent ferroelectric and dielectric properties, i.e., the coercive field decreases while dielectric constant increases as the thickness increases. Theoretical analysis shows that the thickness-dependent electrical properties are mainly attributed to the low dielectric constant of PT buffer layer and the relaxation of internal stress in PZT films.
UR - http://www.scopus.com/inward/record.url?scp=84882617801&partnerID=8YFLogxK
U2 - 10.1007/s10854-013-1279-y
DO - 10.1007/s10854-013-1279-y
M3 - Article
AN - SCOPUS:84882617801
SN - 0957-4522
VL - 24
SP - 3521
EP - 3525
JO - Journal of Materials Science: Materials in Electronics
JF - Journal of Materials Science: Materials in Electronics
IS - 9
ER -