Thermodynamic calculations of ZrC-SiC system for chemical vapor deposition applications from SiCl4-ZrCl4-CH4-H2

Qiaomu Liu; Litong Zhang; Yiguang Wang; Laifei Cheng

doi:10.1002/9780470909836.ch6

Thermodynamic calculations of ZrC-SiC system for chemical vapor deposition applications from SiCl₄-ZrCl₄-CH₄-H₂

Qiaomu Liu^*, Litong Zhang, Yiguang Wang, Laifei Cheng

^*Corresponding author for this work

Northwestern Polytechnical University Xian

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

2 Citations (Scopus)

Abstract

Thermodynamic equilibrium condensed phases for chemical vapor deposition of ZrC-SiC ternary system from SiCl⁴-ZrCl⁴-CH ⁴-H² were calculated by Gibbs free energy minimization method. The effects of partial pressure of reactants, temperatures, total pressures, and carbon sources on the final condensed phases were demonstrated. It was found that the CH₄ partial pressure is the controlling parameter of SiCl₄-ZrCl₄-CH₄-H₂ system. Reasonable reactant concentration ranges, temperatures and pressures for ZrC-SiC system were established according to these deposition phase diagrams. Compared with CH₄, lower temperature is required to decompose C ₃HD due to its lower chemical stability.

Original language	English
Title of host publication	Design, Development, and Applications of Engineering Ceramics and Composites - A Collection of Papers Presented at the 8th Pacific Rim Conference on Ceramic and Glass Technology, PACRIM 8
Publisher	American Ceramic Society
Pages	65-75
Number of pages	11
ISBN (Print)	9780470889367
DOIs	https://doi.org/10.1002/9780470909836.ch6
Publication status	Published - 2010
Externally published	Yes
Event	8th Pacific Rim Conference on Ceramic and Glass Technology, PACRIM-8 - Vancouver, BC, Canada Duration: 31 May 2009 → 5 Jun 2009

Publication series

Name	Ceramic Transactions
Volume	215
ISSN (Print)	1042-1122

Conference

Conference	8th Pacific Rim Conference on Ceramic and Glass Technology, PACRIM-8
Country/Territory	Canada
City	Vancouver, BC
Period	31/05/09 → 5/06/09

Access to Document

10.1002/9780470909836.ch6

Cite this

Liu, Q., Zhang, L., Wang, Y., & Cheng, L. (2010). Thermodynamic calculations of ZrC-SiC system for chemical vapor deposition applications from SiCl₄-ZrCl₄-CH₄-H₂. In Design, Development, and Applications of Engineering Ceramics and Composites - A Collection of Papers Presented at the 8th Pacific Rim Conference on Ceramic and Glass Technology, PACRIM 8 (pp. 65-75). (Ceramic Transactions; Vol. 215). American Ceramic Society. https://doi.org/10.1002/9780470909836.ch6

Liu, Qiaomu ; Zhang, Litong ; Wang, Yiguang et al. / Thermodynamic calculations of ZrC-SiC system for chemical vapor deposition applications from SiCl₄-ZrCl₄-CH₄-H₂. Design, Development, and Applications of Engineering Ceramics and Composites - A Collection of Papers Presented at the 8th Pacific Rim Conference on Ceramic and Glass Technology, PACRIM 8. American Ceramic Society, 2010. pp. 65-75 (Ceramic Transactions).

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abstract = "Thermodynamic equilibrium condensed phases for chemical vapor deposition of ZrC-SiC ternary system from SiCl4-ZrCl4-CH 4-H2 were calculated by Gibbs free energy minimization method. The effects of partial pressure of reactants, temperatures, total pressures, and carbon sources on the final condensed phases were demonstrated. It was found that the CH4 partial pressure is the controlling parameter of SiCl4-ZrCl4-CH4-H2 system. Reasonable reactant concentration ranges, temperatures and pressures for ZrC-SiC system were established according to these deposition phase diagrams. Compared with CH4, lower temperature is required to decompose C 3HD due to its lower chemical stability.",

author = "Qiaomu Liu and Litong Zhang and Yiguang Wang and Laifei Cheng",

year = "2010",

doi = "10.1002/9780470909836.ch6",

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series = "Ceramic Transactions",

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booktitle = "Design, Development, and Applications of Engineering Ceramics and Composites - A Collection of Papers Presented at the 8th Pacific Rim Conference on Ceramic and Glass Technology, PACRIM 8",

note = "8th Pacific Rim Conference on Ceramic and Glass Technology, PACRIM-8 ; Conference date: 31-05-2009 Through 05-06-2009",

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Liu, Q, Zhang, L, Wang, Y & Cheng, L 2010, Thermodynamic calculations of ZrC-SiC system for chemical vapor deposition applications from SiCl₄-ZrCl₄-CH₄-H₂. in Design, Development, and Applications of Engineering Ceramics and Composites - A Collection of Papers Presented at the 8th Pacific Rim Conference on Ceramic and Glass Technology, PACRIM 8. Ceramic Transactions, vol. 215, American Ceramic Society, pp. 65-75, 8th Pacific Rim Conference on Ceramic and Glass Technology, PACRIM-8, Vancouver, BC, Canada, 31/05/09. https://doi.org/10.1002/9780470909836.ch6

Thermodynamic calculations of ZrC-SiC system for chemical vapor deposition applications from SiCl₄-ZrCl₄-CH₄-H₂. / Liu, Qiaomu; Zhang, Litong; Wang, Yiguang et al.
Design, Development, and Applications of Engineering Ceramics and Composites - A Collection of Papers Presented at the 8th Pacific Rim Conference on Ceramic and Glass Technology, PACRIM 8. American Ceramic Society, 2010. p. 65-75 (Ceramic Transactions; Vol. 215).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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AB - Thermodynamic equilibrium condensed phases for chemical vapor deposition of ZrC-SiC ternary system from SiCl4-ZrCl4-CH 4-H2 were calculated by Gibbs free energy minimization method. The effects of partial pressure of reactants, temperatures, total pressures, and carbon sources on the final condensed phases were demonstrated. It was found that the CH4 partial pressure is the controlling parameter of SiCl4-ZrCl4-CH4-H2 system. Reasonable reactant concentration ranges, temperatures and pressures for ZrC-SiC system were established according to these deposition phase diagrams. Compared with CH4, lower temperature is required to decompose C 3HD due to its lower chemical stability.

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Liu Q, Zhang L, Wang Y, Cheng L. Thermodynamic calculations of ZrC-SiC system for chemical vapor deposition applications from SiCl₄-ZrCl₄-CH₄-H₂. In Design, Development, and Applications of Engineering Ceramics and Composites - A Collection of Papers Presented at the 8th Pacific Rim Conference on Ceramic and Glass Technology, PACRIM 8. American Ceramic Society. 2010. p. 65-75. (Ceramic Transactions). doi: 10.1002/9780470909836.ch6