Theoretical studies on the reactions of hydroxyl radicals with trimethylsilane and tetramethylsilane

Hui Zhang, Gui Ling Zhang, Ying Wang, Xiao Yang Yu, Bo Liu*, Jing Yao Liu, Ze Sheng Li

*Corresponding author for this work

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Abstract

The multiple-channel reactions OH + SiH(CH3)3 → products (R1) and the single-channel reaction OH + Si(CH3) 4 → Si(CH3)3CH2 + H 2O (R2) have been studied by means of the direct dynamics method at the BMC-CCSD//MP2/6-311+G(2d,2p) level. The optimized geometries, frequencies and minimum energy path are all obtained at the MP2/6-311+G(2d,2p) levels, and energy information is further refined by the BMC-CCSD (single-point) level. The rate constants for every reaction channels are calculated by canonical variational transition states theory (CVT) with small-curvature tunneling (SCT) contributions over the temperature range 200-2,000 K. The theoretical total rate constants are in good agreement with the available experimental data, and the three-parameter expression k 1 = 2.53×10-21 T 3.14 exp(1, 352.86/T), k 2 = 6.00 × 10-19 T 2.54 exp(-106.11/T) (in unit of cm3 molecule -1 s-1) over the temperature range 200-2,000 K are given. Our calculations indicate that at the low temperature range, for reaction R1, H-abstraction is favored for the SiH group, while the abstraction from the CH3 group is a minor channel.

Original languageEnglish
Pages (from-to)319-327
Number of pages9
JournalTheoretical Chemistry Accounts
Volume119
Issue number4
DOIs
Publication statusPublished - Mar 2008
Externally publishedYes

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Zhang, H., Zhang, G. L., Wang, Y., Yu, X. Y., Liu, B., Liu, J. Y., & Li, Z. S. (2008). Theoretical studies on the reactions of hydroxyl radicals with trimethylsilane and tetramethylsilane. Theoretical Chemistry Accounts, 119(4), 319-327. https://doi.org/10.1007/s00214-007-0387-2