Abstract
With screen-printing technique, a ceramic thick film substrate was fabricated by printing and sintering Ag/Pt alloy internal electrodes and high dielectric constant ceramic thick film insulating layer on Al2O3 ceramic substrate. Thereby a novel thick dielectric electroluminescent (TDEL) device was prepared by using the ceramic thick film substrate. The whole structure of the device is ceramic substrate/internal electrodes/thick dielectric film/light-emitting layer/thin dielectric film/ITO. The threshold voltage and the dependence of brightness on voltage and frequency were measured, respectively. The decay characteristic of the device was also analyzed. Result shows that a thick film electroluminescent device has lower threshold voltage and less dielectric wastage than a thin film electroluminescent device. A TDEL device avoids cross phenomenon effectively.
Original language | English |
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Pages (from-to) | 131-133+146 |
Journal | Beijing Ligong Daxue Xuebao/Transaction of Beijing Institute of Technology |
Volume | 25 |
Issue number | 2 |
Publication status | Published - Feb 2005 |
Keywords
- Ceramic thick film
- Electroluminescence
- Insulator layer