Study on flexible surface dielectric barrier discharge plasma film for in situ inactivation of bacteria and viruses

Yuntao Guo, Mengqi Fang, Liyang Zhang, Jingjun Sun, Xinxin Wang, Jinfeng Tie*, Qun Zhou*, Linqi Zhang*, Haiyun Luo*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

14 Citations (Scopus)

Abstract

COVID-19 is still pandemic in the world although it has lasted for more than two years, in situ real-time disinfection of curved surfaces in public places is extremely urgent. A flexible plasma film based on surface dielectric barrier discharge is proposed in this study. In situ disinfection effect and the influence of curvature on the performance are studied. The results showed that the film could in situ inactivate a variety of pathogens. Specifically, 10 min plasma treatment results in a log reduction of 3.10, 3.42, and 3.03 for Escherichia coli, Staphylococcus aureus, and vesicular stomatitis virus, respectively. The discharge power and disinfection effect of the film are independent of the curvature, which proves that it can be used for in situ disinfection of curved surfaces. It is speculated that the combined effects of a strong electric field and radical etching physical damage as well as the chemical damage of reactive oxygen and nitrogen species to the protein are the main reasons for the inactivation of pathogens. The inhibition of the film to Omicron type SARS-CoV-2 pseudovirus is 99.3%, and the killing rate to natural bacteria is 94.3%. The film can run for at least 10 h without significant reduction in disinfection effect. In addition, large-scale and digitalization increase the practical potential of a disinfection film. In conclusion, this film is expected to realize in situ real-time disinfection of curved surfaces such as the buttons of the elevator or instrument and door handles, which is of great significance in blocking the spread of COVID-19.

Original languageEnglish
Article number074101
JournalApplied Physics Letters
Volume121
Issue number7
DOIs
Publication statusPublished - 15 Aug 2022
Externally publishedYes

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