Strategy of restraining ripple error on surface for optical fabrication

The influence from the ripple error to the high imaging quality is effectively reduced by restraining the ripple height. A method based on the process parameters and the surface error distribution is designed to suppress the ripple height in this paper. The generating mechanism of the ripple error is analyzed by polishing theory with uniform removal character. The relation between the processing parameters (removal functions, pitch of path, and dwell time) and the ripple error is discussed through simulations. With these, the strategy for diminishing the error is presented. A final process is designed and demonstrated on K9 work-pieces using the optimizing strategy with magnetorheological jet polishing. The form error on the surface is decreased from 0.216λ PV (λ = 632.8 nm) and 0.039λ RMS to 0.03&lambda PV and 0.004λ RMS. And the ripple error is restrained well at the same time, because the ripple height is less than 6 nm on the final surface. Results indicate that these strategies are suitable for high-precision optical manufacturing.