Abstract
On wafer 0.16 μm NMOS transistors are stressed and measured. Soft breakdown effects on MOS switch and passive mixer are evaluated. Time constant for the switch increases. Conversion gain and LO feed-through of the mixer degraded.
Original language | English |
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Article number | 1315435 |
Pages (from-to) | 653-654 |
Number of pages | 2 |
Journal | IEEE International Reliability Physics Symposium Proceedings |
Volume | 2004-January |
Issue number | January |
DOIs | |
Publication status | Published - 2004 |
Externally published | Yes |
Event | 42nd Annual IEEE International Reliability Physics Symposium, IRPS 2004 - Phoenix, United States Duration: 25 Apr 2004 → 29 Apr 2004 |
Keywords
- MOS switch
- Passive mixer
- Soft breakdown