Abstract
Here, we have fabricated high-performance near-infrared (NIR) tunnelling heterojunction photodetectors (THPDs) by in-situ synthesizing three-dimensional (3D) graphene on Si with the insertion of a high-κ tunnelling layer. Combining the high light-harvesting ability of 3D-graphene and the effective dark current suppression of the high-κ tunnelling layer, the trade-off between the ultrafast response and ultra-sensitivity in graphene-based PDs is successfully bridged. Our device exhibits ultra-high responsivity (11.2 A/W), excellent specific detectivity (5.9 ×10 10 Jones), and ultra-fast response (168 μs) at the communication wavelength (1550 nm). This work provides a universal strategy to fabricate high-performance and low-cost graphene/silicon PDs in the communication wavelength.
Original language | English |
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Pages (from-to) | 1818-1821 |
Number of pages | 4 |
Journal | IEEE Electron Device Letters |
Volume | 43 |
Issue number | 11 |
DOIs | |
Publication status | Published - 1 Nov 2022 |
Keywords
- 3D-graphene
- NIR tunnelling photodetector
- interfacial engineering