Research on the UV optical and surface property of HfO₂ film by Ion-assisted deposition

Single layer HfO₂ thin films are prepared by Ion Assisted Deposition (IAD). Refractive index and extinction coefficient of these deposited films are studied. The result shows that its optical properties have close relationship with deposition craft parameters. Deposition rate, baking temperature, ion beam and oxygen flux have different effects on UV optical property of single layer HfO₂ films. Based on orthogonal experiments, the impact of different process factor on single layer HfO₂ thin films is analyzed, and optimal process parameters are found. And the impact of typical process factors on surface morphology of the film, which will cause UV scattering loss, is analyzed as well.