TY - JOUR
T1 - Reliable Simulation Analysis of Interface and SiON Degradation Effects on Water Vapor Barrier in Laminated Thin-Film Encapsulation
AU - Liu, Xianwen
AU - Sun, Tao
AU - Li, Xuyang
AU - Liu, Bin
AU - Yao, Qi
AU - Zhang, Shuo
AU - Bao, Zongchi
AU - Wang, Feng
AU - Wang, Tao
AU - Hong, Rui
AU - Qiu, Anyuan
AU - Yu, Zhinong
N1 - Publisher Copyright:
© 2024 Wiley-VCH GmbH.
PY - 2024
Y1 - 2024
N2 - The water vapor barrier performance of laminated thin-film encapsulations (TFEs) is crucial for ensuring the stability of flexible organic light-emitting diode (OLED) devices. In this study, the effects of interfaces and SiON degradation on the water vapor barrier performance of TFEs consisting of SiNx and SiON by finite-element simulation are investigated. In the results, it is illustrated that the interface can significantly hinder water vapor transmission, and the interfacial phase of SiON/SiNx is found to be more effective in impeding water vapor transmission compared to that of SiNx/SiON. The barrier property of TFEs can be weakened by SiON degradation due to oxidation under high temperature and humidity. Among the analyzed four structures, 450 nm SiNx/50 nm SiON/450 nm SiNx/50 nm SiON exhibits the best barrier performance due to strongest interface effects and minimal SiON degradation. These simulation results correlate well with experimental reliability tests, validating the simulation model's reliability. In this study, valuable insights into optimizing TFEs designs for enhanced barrier performances in flexible OLED devices are provided.
AB - The water vapor barrier performance of laminated thin-film encapsulations (TFEs) is crucial for ensuring the stability of flexible organic light-emitting diode (OLED) devices. In this study, the effects of interfaces and SiON degradation on the water vapor barrier performance of TFEs consisting of SiNx and SiON by finite-element simulation are investigated. In the results, it is illustrated that the interface can significantly hinder water vapor transmission, and the interfacial phase of SiON/SiNx is found to be more effective in impeding water vapor transmission compared to that of SiNx/SiON. The barrier property of TFEs can be weakened by SiON degradation due to oxidation under high temperature and humidity. Among the analyzed four structures, 450 nm SiNx/50 nm SiON/450 nm SiNx/50 nm SiON exhibits the best barrier performance due to strongest interface effects and minimal SiON degradation. These simulation results correlate well with experimental reliability tests, validating the simulation model's reliability. In this study, valuable insights into optimizing TFEs designs for enhanced barrier performances in flexible OLED devices are provided.
KW - SiON degradations
KW - finite-element simulations
KW - interfaces
KW - thin-film encapsulations
KW - water vapor barrier performances
UR - http://www.scopus.com/inward/record.url?scp=85209801205&partnerID=8YFLogxK
U2 - 10.1002/pssa.202400577
DO - 10.1002/pssa.202400577
M3 - Article
AN - SCOPUS:85209801205
SN - 1862-6300
JO - Physica Status Solidi (A) Applications and Materials Science
JF - Physica Status Solidi (A) Applications and Materials Science
ER -