Profile evolution during photochemical nano-polishing of a rough quartz surface under direct illumination

Vasyl Kanevskii; Serhii Kolienov; Valerii Grygoruk; Oleksandr Stelmakh; Hao Zhang

doi:10.1364/AO.460844

Profile evolution during photochemical nano-polishing of a rough quartz surface under direct illumination

Vasyl Kanevskii, Serhii Kolienov, Valerii Grygoruk, Oleksandr Stelmakh, Hao Zhang^*

^*Corresponding author for this work

School of Mechanical Engineering

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

A model for photochemical polishing of a rough quartz surface has been developed that uses the near field rising above a given surface under the action of electromagnetic radiation. The model allows solving the problem of predicting the results without the need for time-consuming calculations. Simulation of the etching of the quartz surface profile in the spatial frequency domain is used. The features of the surface profile evolution are analyzed, and the dependences of this evolution on the initial correlation length and standard deviation of a rough quartz surface profile as well as radiation wavelength are shown.

Original language	English
Pages (from-to)	5128-5135
Number of pages	8
Journal	Applied Optics
Volume	61
Issue number	17
DOIs	https://doi.org/10.1364/AO.460844
Publication status	Published - 10 Jun 2022

Access to Document

10.1364/AO.460844

Cite this

@article{18bd99a7e4a84c778136b14bf0324b31,

title = "Profile evolution during photochemical nano-polishing of a rough quartz surface under direct illumination",

abstract = "A model for photochemical polishing of a rough quartz surface has been developed that uses the near field rising above a given surface under the action of electromagnetic radiation. The model allows solving the problem of predicting the results without the need for time-consuming calculations. Simulation of the etching of the quartz surface profile in the spatial frequency domain is used. The features of the surface profile evolution are analyzed, and the dependences of this evolution on the initial correlation length and standard deviation of a rough quartz surface profile as well as radiation wavelength are shown.",

author = "Vasyl Kanevskii and Serhii Kolienov and Valerii Grygoruk and Oleksandr Stelmakh and Hao Zhang",

note = "Publisher Copyright: {\textcopyright} 2022 Optica Publishing Group",

year = "2022",

month = jun,

day = "10",

doi = "10.1364/AO.460844",

language = "English",

volume = "61",

pages = "5128--5135",

journal = "Applied Optics",

issn = "1559-128X",

publisher = "Optica Publishing Group",

number = "17",

}

TY - JOUR

T1 - Profile evolution during photochemical nano-polishing of a rough quartz surface under direct illumination

AU - Kanevskii, Vasyl

AU - Kolienov, Serhii

AU - Grygoruk, Valerii

AU - Stelmakh, Oleksandr

AU - Zhang, Hao

PY - 2022/6/10

Y1 - 2022/6/10

N2 - A model for photochemical polishing of a rough quartz surface has been developed that uses the near field rising above a given surface under the action of electromagnetic radiation. The model allows solving the problem of predicting the results without the need for time-consuming calculations. Simulation of the etching of the quartz surface profile in the spatial frequency domain is used. The features of the surface profile evolution are analyzed, and the dependences of this evolution on the initial correlation length and standard deviation of a rough quartz surface profile as well as radiation wavelength are shown.

AB - A model for photochemical polishing of a rough quartz surface has been developed that uses the near field rising above a given surface under the action of electromagnetic radiation. The model allows solving the problem of predicting the results without the need for time-consuming calculations. Simulation of the etching of the quartz surface profile in the spatial frequency domain is used. The features of the surface profile evolution are analyzed, and the dependences of this evolution on the initial correlation length and standard deviation of a rough quartz surface profile as well as radiation wavelength are shown.

UR - http://www.scopus.com/inward/record.url?scp=85132043133&partnerID=8YFLogxK

U2 - 10.1364/AO.460844

DO - 10.1364/AO.460844

M3 - Article

C2 - 36256191

AN - SCOPUS:85132043133

SN - 1559-128X

VL - 61

SP - 5128

EP - 5135

JO - Applied Optics

JF - Applied Optics

IS - 17

ER -

Profile evolution during photochemical nano-polishing of a rough quartz surface under direct illumination

Abstract

Access to Document

Other files and links

Fingerprint

Cite this