Plasmonic Metasurfaces with High UV–Vis Transmittance for Photopatterning of Designer Molecular Orientations

Hao Yu, Miao Jiang, Yubing Guo, Taras Turiv, Wu Lu, Vishva Ray, Oleg D. Lavrentovich, Qi Huo Wei*

*Corresponding author for this work

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Abstract

Recent developments of utilizing plasmonic metasurfaces in photopatterning of designer molecular orientations have facilitated numerous new applications of liquid crystals; while the optical efficiency of the metamasks remains a critical issue, especially in the UV region. Here a new design of plasmonic metasurfaces made of parallelepiped arrays is presented which yield very high and broadband transmission in the UV–vis wavelength range. It is shown that this plasmonic metamask exhibits two polarization peaks originated from a cavity mode and lattice resonance respectively and demonstrated that complex designer molecular orientations can be photopatterned by using this metamask with significantly reduced exposure time. This type of high-efficiency broadband plasmonic metasurfaces is not only important for high resolution photopatterning of molecular orientation but also tailorable for various other flat optics applications in the UV and near UV regions.

Original languageEnglish
Article number1900117
JournalAdvanced Optical Materials
Volume7
Issue number11
DOIs
Publication statusPublished - 4 Jun 2019
Externally publishedYes

Keywords

  • liquid crystals
  • nanomanufacturing
  • photoalignments
  • plasmonic metasurfaces
  • topological defects

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Yu, H., Jiang, M., Guo, Y., Turiv, T., Lu, W., Ray, V., Lavrentovich, O. D., & Wei, Q. H. (2019). Plasmonic Metasurfaces with High UV–Vis Transmittance for Photopatterning of Designer Molecular Orientations. Advanced Optical Materials, 7(11), Article 1900117. https://doi.org/10.1002/adom.201900117