NiO hierarchical nanorings on SiC: Enhancing relaxation to tune microwave absorption at elevated temperature

Hui Jing Yang, Wen Qiang Cao, De Qing Zhang*, Tie Jian Su, Hong Long Shi, Wen Zhong Wang, Jie Yuan, Mao Sheng Cao

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

385 Citations (Scopus)

Abstract

We fabricated NiO nanorings on SiC, a novel hierarchical architecture, by a facile two-step method. The dielectric properties depend on temperature and frequency in the range from 373 to 773 K and X band. The imaginary part and loss tangent increase more than four times and three times with increasing temperature, respectively. The architecture demonstrates multirelaxation and possesses high-efficient absorption. The reflection loss exceeds-40 dB and the bandwidth covers 85% of X band (approximately-20 dB). The synergistic effect between multirelaxation and conductance is beneficial to the microwave absorption. Our findings provide a novel and feasible strategy to tune microwave absorption.

Original languageEnglish
Pages (from-to)7073-7077
Number of pages5
JournalACS applied materials & interfaces
Volume7
Issue number13
DOIs
Publication statusPublished - 8 Apr 2015

Keywords

  • Dielectric properties
  • Hierarchical architecture
  • Microwave absorption
  • Multirelaxation
  • NiO nanorings

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